Inventor · disambiguated record
Herbert H. Sawin
Also filed as: SAWIN HERBERT H · SAWIN HERBERT HAROLD
13 granted patents·9 pending applications·1,775 citations·filing 1989–2007
95Inventor score
Top patents by PatentIndex Score
22 records- 0198US5450205AApparatus and method for real-time measurement of thin film layer thickness and changes thereofMASSACHUSETTS INST TECHNOLOGY·Filed 1993·Granted Sep 12, 1995·319 cites·29 claims
- 0298US5061838AToroidal electron cyclotron resonance reactorMASSACHUSETTS INST TECHNOLOGY·Filed 1989·Granted Oct 29, 1991·360 cites·33 claims
- 0397US6740247B1HF vapor phase wafer cleaning and oxide etchingMASSACHUSETTS INST TECHNOLOGY·Filed 2000·Granted May 25, 2004·215 cites·10 claims
- 0497US5888591AChemical vapor deposition of fluorocarbon polymer thin filmsMASSACHUSETTS INST TECHNOLOGY·Filed 1996·Granted Mar 30, 1999·245 cites·15 claims
- 0596US6156435AChemical vapor deposition of fluorocarbon polymer thin filmsMASSACHUSETTS INST TECHNOLOGY·Filed 1999·Granted Dec 5, 2000·187 cites·14 claims
- 0694US7037846B2Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processingAXCELIS TECH INC·Filed 2004·Granted May 2, 2006·98 cites·11 claims
- 0792US6761796B2Method and apparatus for micro-jet enabled, low-energy ion generation transport in plasma processingAXCELIS TECH INC·Filed 2001·Granted Jul 13, 2004·75 cites·11 claims
- 0889US6153115AMonitor of plasma processes with multivariate statistical analysis of plasma emission spectraMASSACHUSETTS INST TECHNOLOGY·Filed 1997·Granted Nov 28, 2000·120 cites·40 claims
- 0989US6153269AChemical vapor deposition of fluorocarbon polymer thin filmsMASSACHUSETTS INST TECHNOLOGY·Filed 1999·Granted Nov 28, 2000·82 cites·8 claims
- 1070US6083413AMetals removal processMASSACHUSETTS INST TECHNOLOGY·Filed 1996·Granted Jul 4, 2000·41 cites·26 claims
- 1152US2007028943A1Method of using sulfur fluoride for removing surface depositsSAWIN HERBERT H·Filed 2006·Application pending·0 cites
- 1252US2007028944A1Method of using NF3 for removing surface depositsSAWIN HERBERT H·Filed 2006·Application pending·0 cites
- 1352US2008087642A1Method for removing surface deposits in the interior of a chemical vapor deposition reactorSAWIN HERBERT H·Filed 2007·Application pending·0 cites
- 1449US2007107750A1Method of using NF3 for removing surface deposits from the interior of chemical vapor deposition chambersSAWIN HERBERT H·Filed 2006·Application pending·0 cites
- 1548US2006144820A1Remote chamber methods for removing surface depositsSAWIN HERBERT H·Filed 2005·Application pending·0 cites
- 1647US6183566B1UV/halogen metals removal processFSI INT INC·Filed 1999·Granted Feb 6, 2001·12 cites·23 claims
- 1747US5954884AUV/halogen metals removal processFSI INT INC·Filed 1997·Granted Sep 21, 1999·12 cites·11 claims
- 1844US2009047447A1Method for removing surface deposits and passivating interior surfaces of the interior of a chemical vapor deposition reactorSAWIN HERBERT H·Filed 2006·Application pending·0 cites
- 1943US2006144819A1Remote chamber methods for removing surface depositsSAWIN HERBERT H·Filed 2005·Application pending·0 cites
- 2042US2005003669A1HF vapor phase cleaning and oxide etchingMASSACHUSETTS INST TECHNOLOGY·Filed 2004·Application pending·0 cites
- 2141US6107166AVapor phase cleaning of alkali and alkaline earth metalsFSI INT INC·Filed 1997·Granted Aug 22, 2000·9 cites·25 claims
- 2240US2005258137A1Remote chamber methods for removing surface depositsSAWIN HERBERT H·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →