Inventor · disambiguated record
Cheng-Ku Chen
Also filed as: CHEN CHENG-KU
10 granted patents·2 pending applications·156 citations·filing 1998–2011
90Inventor score
Top patents by PatentIndex Score
12 records- 0196US8421166B2Semiconductor device and fabrication thereofCHI MIN-HWA·Filed 2011·Granted Apr 16, 2013·29 cites·12 claims
- 0285US7071515B2Narrow width effect improvement with photoresist plug process and STI corner ion implantationTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jul 4, 2006·42 cites·20 claims
- 0380US7371634B2Amorphous carbon contact film for contact hole etch processTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted May 13, 2008·5 cites·24 claims
- 0479US7291553B2Method for forming dual damascene with improved etch profilesTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Nov 6, 2007·9 cites·21 claims
- 0577US7399679B2Narrow width effect improvement with photoresist plug process and STI corner ion implantationTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jul 15, 2008·5 cites·25 claims
- 0677US6500727B1Silicon shallow trench etching with round top corner by photoresist-free processTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Dec 31, 2002·25 cites·39 claims
- 0774US6787455B2Bi-layer photoresist method for forming high resolution semiconductor featuresTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Sep 7, 2004·16 cites·20 claims
- 0864US7129140B2Method of forming polysilicon gate structures with specific edge profiles for optimization of LDD offset spacingTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Oct 31, 2006·9 cites·27 claims
- 0957US7633110B2Memory cellTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Dec 15, 2009·6 cites·17 claims
- 1042US5962193AMethod and apparatus for controlling air flow in a liquid coaterTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Oct 5, 1999·10 cites·20 claims
- 1138US2007200179A1Strain enhanced CMOS architecture with amorphous carbon film and fabrication method of forming the sameTAIWAN SEMICONDUCTOR MFG·Filed 2006·Application pending·0 cites
- 1237US2003096465A1Hard mask trimming with thin hard mask layer and top protection layerTAIWAN SEMICONDUCTOR MFG·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →