Inventor · disambiguated record
Nobuyasu Nishiyama
Also filed as: NISHIYAMA NOBUYASU
9 granted patents·2 pending applications·71 citations·filing 2006–2012
86Inventor score
Top patents by PatentIndex Score
11 records- 0192US8833388B2Pressure controlling apparatusETO HIDEO·Filed 2012·Granted Sep 16, 2014·19 cites·15 claims
- 0290US7683436B2Semiconductor device having a pole-shaped portion and method of fabricating the sameTOSHIBA KK·Filed 2007·Granted Mar 23, 2010·19 cites·14 claims
- 0386US8036036B2Semiconductor device and a manufacturing method thereofTOSHIBA KK·Filed 2009·Granted Oct 11, 2011·12 cites·9 claims
- 0486US7906435B2Semiconductor device and a manufacturing method thereofTOSHIBA KK·Filed 2010·Granted Mar 15, 2011·9 cites·1 claims
- 0584US7723807B2Semiconductor device and a manufacturing method thereofTOSHIBA KK·Filed 2007·Granted May 25, 2010·11 cites·17 claims
- 0662US7767582B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Granted Aug 3, 2010·1 cites·19 claims
- 0748US2013008603A1Coaxial cable and substrate processing apparatusTOSHIBA KK·Filed 2012·Application pending·0 cites
- 0846US8760053B2Power supply control device, plasma processing device, and plasma processing methodETO HIDEO·Filed 2011·Granted Jun 24, 2014·0 cites·20 claims
- 0939US2012000887A1Plasma treatment apparatus and plasma treatment methodETO HIDEO·Filed 2011·Application pending·0 cites
- 1038US8651135B2Mass flow controller, mass flow controller system, substrate processing device, and gas flow rate adjusting methodETO HIDEO·Filed 2011·Granted Feb 18, 2014·0 cites·7 claims
- 1138US8062938B2Semiconductor device and method of fabricating the sameNISHIYAMA NOBUYASU·Filed 2010·Granted Nov 22, 2011·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →