Inventor · disambiguated record
Wen-Chang Hsueh
Also filed as: HSUEH WEN-CHANG
11 granted patents·1 pending application·9 citations·filing 2014–2023
83Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD12
Top patents by PatentIndex Score
12 records- 0190US11294271B2Mask for extreme ultraviolet photolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·2 cites·20 claims
- 0286US11740547B2Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effectTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 29, 2023·1 cites·20 claims
- 0385US10996553B2Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 4, 2021·3 cites·20 claims
- 0480US12130548B2Extreme ultraviolet mask with reduced wafer neighboring effectTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 0577US12019367B2Mask blanks and methods for depositing layers on mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 25, 2024·0 cites·20 claims
- 0676US11815805B2Mask for extreme ultraviolet photolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 14, 2023·0 cites·20 claims
- 0771US11531262B2Mask blanks and methods for depositing layers on mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 20, 2022·0 cites·20 claims
- 0871US9530200B2Method and system for inspection of a patterned structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 27, 2016·2 cites·18 claims
- 0969US9429835B2Structure and method of photomask with reduction of electron-beam scatterringTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 30, 2016·1 cites·20 claims
- 1062US2024053669A1Euv photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1154US11143954B2Mask patterns and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 12, 2021·0 cites·20 claims
- 1250US9341940B2Reticle and method of fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 17, 2016·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →