Inventor · disambiguated record
Giovanni Antonio Foggiato
Also filed as: FOGGIATO GIOVANNI · FOGGIATO GIOVANNI ANTONIO
12 granted patents·2 pending applications·831 citations·filing 1997–2013
94Inventor score
Top patents by PatentIndex Score
14 records- 0197US6051321ALow dielectric constant materials and methodQUESTER TECHNOLOGY INC·Filed 1997·Granted Apr 18, 2000·236 cites·37 claims
- 0293US6086679ADeposition systems and processes for transport polymerization and chemical vapor depositionQUESTER TECHNOLOGY INC·Filed 1997·Granted Jul 11, 2000·137 cites·76 claims
- 0390US6140456AChemicals and processes for making fluorinated poly(para-xylylenes)QUESTER TECHOLOGY INC·Filed 1997·Granted Oct 31, 2000·72 cites·32 claims
- 0485US6323297B1Low dielectric constant materials with improved thermal and mechanical propertiesQUESTER TECHNOLOGY INC·Filed 1997·Granted Nov 27, 2001·27 cites·22 claims
- 0585US6079353AChamber for reducing contamination during chemical vapor depositionQUESTER TECHNOLOGY INC·Filed 1998·Granted Jun 27, 2000·60 cites·29 claims
- 0684US6020458APrecursors for making low dielectric constant materials with improved thermal stabilityQUESTER TECHNOLOGY INC·Filed 1997·Granted Feb 1, 2000·57 cites·18 claims
- 0783US6049086ALarge area silent discharge excitation radiatorQUESTER TECHNOLOGY INC·Filed 1998·Granted Apr 11, 2000·45 cites·56 claims
- 0882US6015759ASurface modification of semiconductors using electromagnetic radiationQUESTER TECHNOLOGY INC·Filed 1997·Granted Jan 18, 2000·72 cites·61 claims
- 0981US6534616B2Precursors for making low dielectric constant materials with improved thermal stabilityQUESTER TECHNOLOGY INC·Filed 2001·Granted Mar 18, 2003·20 cites·24 claims
- 1079US6258407B1Precursors for making low dielectric constant materials with improved thermal stabilityQUESTER TECHNOLOGY INC·Filed 1999·Granted Jul 10, 2001·43 cites·68 claims
- 1177US6114227AChamber for reducing contamination during chemical vapor depositionQUESTER TECHNOLOGY INC·Filed 1999·Granted Sep 5, 2000·38 cites·31 claims
- 1267US6663973B1Low dielectric constant materials prepared from photon or plasma assisted chemical vapor deposition and transport polymerization of selected compoundsCANON USA INC·Filed 1999·Granted Dec 16, 2003·24 cites·21 claims
- 1342US2004234779A1Fluorinated aromatic precursorsFiled 2003·Application pending·0 cites
- 1437US2013200170A1Gas Dispersion Plate for Plasma Reactor Having Extended LifetimeGREEN TWEED OF DELAWARE INC·Filed 2013·Application pending·0 cites
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