Inventor · disambiguated record
Chuen-Huei Yang
Also filed as: YANG CHUEN-HUEI
12 granted patents·6 pending applications·64 citations·filing 1997–2008
88Inventor score
Top patents by PatentIndex Score
18 records- 0178US7669153B2Method for correcting photomask patternUNITED MICROELECTRONICS CORP·Filed 2007·Granted Feb 23, 2010·5 cites·13 claims
- 0270US7664614B2Method of inspecting photomask defectUNITED MICROELECTRONICS CORP·Filed 2007·Granted Feb 16, 2010·3 cites·13 claims
- 0367USD396338SScarfYANG CHUEN HUEI·Filed 1997·Granted Jul 28, 1998·17 cites·1 claims
- 0465US5916717AProcess utilizing relationship between reflectivity and resist thickness for inhibition of side effect caused by halftone phase shift masksIND TECH RES INST·Filed 1998·Granted Jun 29, 1999·24 cites·30 claims
- 0564US7913196B2Method of verifying a layout patternUNITED MICROELECTRONICS CORP·Filed 2007·Granted Mar 22, 2011·3 cites·28 claims
- 0661US8042069B2Method for selectively amending layout patternsUNITED MICROELECTRONICS CORP·Filed 2008·Granted Oct 18, 2011·3 cites·36 claims
- 0757US7312020B2Lithography methodUNITED MICROELECTRONICS CORP·Filed 2003·Granted Dec 25, 2007·6 cites·20 claims
- 0849US7687206B2Mask pattern and method for forming the sameUNITED MICROELECTRONICS CORP·Filed 2007·Granted Mar 30, 2010·0 cites·31 claims
- 0946US7008732B2Photomask patternUNITED MICROELECTRONICS CORP·Filed 2003·Granted Mar 7, 2006·2 cites·20 claims
- 1044US8166424B2Method for constructing OPC modelWU TE-HUNG·Filed 2008·Granted Apr 24, 2012·0 cites·12 claims
- 1144US7141337B2Phase shift maskUNITED MICROELECTRONICS CORP·Filed 2003·Granted Nov 28, 2006·1 cites·13 claims
- 1243US2008178140A1Method for correcting photomask patternUNITED MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 1341US8225237B2Method to determine process windowWU TE-HUNG·Filed 2008·Granted Jul 17, 2012·0 cites·17 claims
- 1439US2004006759A1Method of dividing a semiconductor integrated circuit patternFiled 2002·Application pending·0 cites
- 1532US2004023124A1Photolithography process with hybrid chromeless phase shift maskUNITED MICROELECTRONICS CORP·Filed 2002·Application pending·0 cites
- 1632US2005112473A1Photomask for enhancing contrastFiled 2003·Application pending·0 cites
- 1732US2004013948A1Chromeless PSM with chrome assistant featureUNITED MICROELECTRONICS CORP·Filed 2002·Application pending·0 cites
- 1830US2002110765A1Photolithography process for producing gates and conductive linesUNITED MICROELECTRONICS CORP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →