Inventor · disambiguated record
Clemens Johannes Gerardus Van Den Dungen
Also filed as: VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS
10 granted patents·1 pending application·38 citations·filing 2009–2016
83Inventor score
Files withASML NETHERLANDS BV5DIRECKS DANIEL JOZEF MARIA3VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS2PHILIPS DANNY MARIA HUBERTUS1
Top patents by PatentIndex Score
11 records- 0193US8351018B2Fluid handling structure, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Granted Jan 8, 2013·22 cites·19 claims
- 0287US8421993B2Fluid handling structure, lithographic apparatus and device manufacturing methodDIRECKS DANIEL JOZEF MARIA·Filed 2009·Granted Apr 16, 2013·14 cites·20 claims
- 0362US8638417B2Fluid handling structure, lithographic apparatus and a device manufacturing methodPHILIPS DANNY MARIA HUBERTUS·Filed 2011·Granted Jan 28, 2014·1 cites·25 claims
- 0459US9036127B2Lithographic apparatusVAN DEN DUNGEN CLEMENS JOHANNES GERARDUS·Filed 2009·Granted May 19, 2015·1 cites·20 claims
- 0558US10649341B2Lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted May 12, 2020·0 cites·22 claims
- 0655US9465302B2Lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Oct 11, 2016·0 cites·20 claims
- 0755US9383654B2Fluid handling structure, lithographic apparatus and device manufacturing methodDIRECKS DANIEL JOZEF MARIA·Filed 2009·Granted Jul 5, 2016·0 cites·23 claims
- 0854US11143968B2Fluid handling structure, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Oct 12, 2021·0 cites·20 claims
- 0946US8508712B2Fluid handling structure, lithographic apparatus and device manufacturing methodVAN DEN DUNGEN CLEMENS JOHANNES GERARDUS·Filed 2009·Granted Aug 13, 2013·0 cites·18 claims
- 1039US9618835B2Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressureDIRECKS DANIEL JOZEF MARIA·Filed 2011·Granted Apr 11, 2017·0 cites·20 claims
- 1136US2011007286A1Lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →