Inventor · disambiguated record
Miki Kobayashi
Also filed as: KOBAYASHI MIKI
16 granted patents·1 pending application·285 citations·filing 1990–2023
94Inventor score
Files withTOKYO OHKA KOGYO CO LTD4PANASONIC IP MAN CO LTD3SHINETSU CHEMICAL CO3ASTELLAS PHARMA INC2MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2
Top patents by PatentIndex Score
17 records- 0192USD558754SPersonal computerMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Granted Jan 1, 2008·52 cites·1 claims
- 0286US6740662B1Naphthyridine derivativesYAMANOUCHI PHARMA CO LTD·Filed 2000·Granted May 25, 2004·31 cites·8 claims
- 0384US6440646B2Positive resist composition suitable for lift-off technique and pattern forming methodSHINETSU CHEMICAL CO·Filed 2001·Granted Aug 27, 2002·21 cites·20 claims
- 0480US5185262ADNA fragment containing gene which encodes the function of stabilizing plasmid in host microorganismMITSUBISHI PETROCHEMICAL CO·Filed 1990·Granted Feb 9, 1993·76 cites·11 claims
- 0578US6210855B1Positive resist composition suitable for lift-off technique and pattern forming methodSHINETSU CHEMICAL CO·Filed 1999·Granted Apr 3, 2001·35 cites·3 claims
- 0671USD483356SPortable computerMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Dec 9, 2003·17 cites·1 claims
- 0769US7196080B2PhenylpyridinecarbonylpiperazinederivativeASTELLAS PHARMA INC·Filed 2002·Granted Mar 27, 2007·5 cites·7 claims
- 0865US6296992B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Oct 2, 2001·6 cites·7 claims
- 0962US5773200APositive resist composition suitable for lift-off technique and pattern forming methodSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 30, 1998·22 cites·10 claims
- 1060US6207340B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Mar 27, 2001·4 cites·6 claims
- 1147USD824105SElectric clipperPANASONIC IP MAN CO LTD·Filed 2017·Granted Jul 24, 2018·4 cites·1 claims
- 1247US2007167450A1Agent for treating chronic pelvic pain syndromeASTELLAS PHARMA INC·Filed 2004·Application pending·0 cites
- 1346US6177226B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jan 23, 2001·7 cites·2 claims
- 1444US8068165B2Imaging apparatusKOBAYASHI MIKI·Filed 2007·Granted Nov 29, 2011·0 cites·12 claims
- 1540USD1061470STelephone handsetPANASONIC IP MAN CO LTD·Filed 2023·Granted Feb 11, 2025·0 cites·1 claims
- 1639USD1059322STelephone base unitPANASONIC IP MAN CO LTD·Filed 2023·Granted Jan 28, 2025·0 cites·1 claims
- 1738US6127087APositive photoresist compositions and multilayer resist materials using sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Oct 3, 2000·5 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →