Inventor · disambiguated record
Thomas Laidig
Also filed as: LAIDIG THOMAS · LAIDIG THOMAS L
82 granted patents·16 pending applications·1,503 citations·filing 1995–2025
99Inventor score
Files withAPPLIED MATERIALS INC60ASML MASKTOOLS BV22CHEN JANG FUNG6LAIDIG THOMAS3MICROUNITY SYSTEMS ENG3
Top patents by PatentIndex Score
98 records- 0198US7175940B2Method of two dimensional feature model calibration and optimizationASML MASKTOOLS BV·Filed 2002·Granted Feb 13, 2007·365 cites·20 claims
- 0298US5821014AOptical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a maskMICROUNITY SYSTEMS ENG·Filed 1997·Granted Oct 13, 1998·291 cites·25 claims
- 0398US5663893AMethod for generating proximity correction features for a lithographic mask patternMICROUNITY SYSTEMS ENG·Filed 1995·Granted Sep 2, 1997·257 cites·15 claims
- 0497US10571809B1Half tone scheme for maskless lithographyAPPLIED MATERIALS INC·Filed 2019·Granted Feb 25, 2020·9 cites·20 claims
- 0596US12117732B2Image stabilization for digital lithographyAPPLIED MATERIALS INC·Filed 2020·Granted Oct 15, 2024·3 cites·15 claims
- 0696US9025136B2System and method for manufacturing three dimensional integrated circuitsCHEN JANG FUNG·Filed 2011·Granted May 5, 2015·15 cites·16 claims
- 0795US10503076B1Reserving spatial light modulator sections to address field non-uniformitiesAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·4 cites·19 claims
- 0894US8390781B2Optical imaging writer systemLAIDIG THOMAS·Filed 2010·Granted Mar 5, 2013·12 cites·24 claims
- 0994US8390786B2Optical imaging writer systemLAIDIG THOMAS·Filed 2010·Granted Mar 5, 2013·13 cites·20 claims
- 1094US6670081B2Optical proximity correction method utilizing serifs having variable dimensionsASML MASKTOOLS BV·Filed 2001·Granted Dec 30, 2003·61 cites·13 claims
- 1193US11868700B2Use of adaptive replacement maps in digital lithography for local cell replacementAPPLIED MATERIALS INC·Filed 2021·Granted Jan 9, 2024·2 cites·20 claims
- 1293US10416550B2Method to reduce line wavinessAPPLIED MATERIALS INC·Filed 2018·Granted Sep 17, 2019·3 cites·20 claims
- 1393US9791786B1Method to reduce line wavinessAPPLIED MATERIALS INC·Filed 2016·Granted Oct 17, 2017·4 cites·20 claims
- 1493US7247574B2Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jul 24, 2007·47 cites·22 claims
- 1592US8132130B2Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure processCHEN JANG FUNG·Filed 2006·Granted Mar 6, 2012·15 cites·19 claims
- 1692US6623895B2Hybrid phase-shift maskASML MASKTOOLS BV·Filed 2001·Granted Sep 23, 2003·38 cites·23 claims
- 1791US9507271B1System and method for manufacturing multiple light emitting diodes in parallelCHEN JANG FUNG·Filed 2011·Granted Nov 29, 2016·7 cites·14 claims
- 1891US8670106B2Optical imaging writer systemCHEN JANG FUNG·Filed 2009·Granted Mar 11, 2014·12 cites·24 claims
- 1991US8395752B2Optical imaging writer systemLAIDIG THOMAS·Filed 2010·Granted Mar 12, 2013·8 cites·20 claims
- 2090US9250509B2Optical projection array exposure systemAPPLIED MATERIALS INC·Filed 2013·Granted Feb 2, 2016·6 cites·16 claims
- 2190US8253923B1Optical imaging writer systemCHEN JANG FUNG·Filed 2008·Granted Aug 28, 2012·11 cites·21 claims
- 2290US7820341B2Method of two dimensional feature model calibration and optimizationASML MASKTOOLS BV·Filed 2007·Granted Oct 26, 2010·12 cites·24 claims
- 2389US11899198B2Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systemsAPPLIED MATERIALS INC·Filed 2022·Granted Feb 13, 2024·1 cites·20 claims
- 2489US7523438B2Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSMASML MASKTOOLS BV·Filed 2005·Granted Apr 21, 2009·15 cites·10 claims
- 2589US7355681B2Optical proximity correction using chamfers and rounding at cornersASML MASKTOOLS BV·Filed 2005·Granted Apr 8, 2008·10 cites·16 claims
- 2689US6851103B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2003·Granted Feb 1, 2005·44 cites·18 claims
- 2788US9519226B2Optical imaging writer systemAPPLIED MATERIALS INC·Filed 2014·Granted Dec 13, 2016·4 cites·3 claims
- 2887US10983441B2Resolution enhanced digital lithography with anti-blazed DMDAPPLIED MATERIALS INC·Filed 2019·Granted Apr 20, 2021·2 cites·13 claims
- 2987US7774736B2Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2007·Granted Aug 10, 2010·8 cites·20 claims
- 3087US7349066B2Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influenceASML MASKTOOLS BV·Filed 2005·Granted Mar 25, 2008·9 cites·21 claims
- 3187US7231629B2Feature optimization using enhanced interference mapping lithographyASML MASKTOOLS BV·Filed 2004·Granted Jun 12, 2007·27 cites·27 claims
- 3286US10495979B1Half tone scheme for maskless lithographyAPPLIED MATERIALS INC·Filed 2019·Granted Dec 3, 2019·2 cites·20 claims
- 3386US7550235B2Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jun 23, 2009·25 cites·12 claims
- 3485US12372779B2Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systemsAPPLIED MATERIALS INC·Filed 2024·Granted Jul 29, 2025·0 cites·20 claims
- 3585US12360467B2Dynamic generation of layout adaptive packagingAPPLIED MATERIALS INC·Filed 2023·Granted Jul 15, 2025·0 cites·26 claims
- 3684US9158190B2Optical imaging writer systemCHEN JANG FUNG·Filed 2012·Granted Oct 13, 2015·3 cites·20 claims
- 3784US2025021016A1Image stabilization for digital lithographyAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3883US9733573B2Optical projection array exposure systemAPPLIED MATERIALS INC·Filed 2016·Granted Aug 15, 2017·2 cites·15 claims
- 3983US7892707B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2009·Granted Feb 22, 2011·4 cites·26 claims
- 4083US7398508B2Eigen decomposition based OPC modelASML MASKTOOKS B V·Filed 2004·Granted Jul 8, 2008·27 cites·22 claims
- 4182US11899379B2Dynamic generation of layout adaptive packagingAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·12 claims
- 4282US7485396B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2008·Granted Feb 3, 2009·4 cites·12 claims
- 4382US7434195B2Method for performing full-chip manufacturing reliability checking and correctionASML MASKTOOLS BV·Filed 2005·Granted Oct 7, 2008·13 cites·11 claims
- 4481US10031427B2Methods and apparatus for vibration damping stageAPPLIED MATERIALS INC·Filed 2015·Granted Jul 24, 2018·3 cites·20 claims
- 4581US9927696B2Method to reduce line wavinessAPPLIED MATERIALS INC·Filed 2017·Granted Mar 27, 2018·1 cites·20 claims
- 4680US12141517B2Use of adaptive replacement maps in digital lithography for local cell replacementAPPLIED MATERIALS INC·Filed 2023·Granted Nov 12, 2024·0 cites·20 claims
- 4779US7354681B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2004·Granted Apr 8, 2008·11 cites·15 claims
- 4878US9927723B2Apparatus and methods for on-the-fly digital exposure image data modificationAPPLIED MATERIALS INC·Filed 2016·Granted Mar 27, 2018·2 cites·14 claims
- 4978US7549140B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2005·Granted Jun 16, 2009·5 cites·13 claims
- 5077US8914143B1Method and system for handling substratesKASKEY JEFFREY·Filed 2011·Granted Dec 16, 2014·5 cites·18 claims
Showing the top 50 of 98 patent records by PatentIndex Score.
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