Inventor · disambiguated record
John W. Coburn
Also filed as: COBURN JOHN W
6 granted patents·157 citations·filing 1977–2005
86Inventor score
Top patents by PatentIndex Score
6 records- 0192US7148073B1Methods and systems for preparing a copper containing substrate for analysisKLA TENCOR TECH CORP·Filed 2005·Granted Dec 12, 2006·24 cites·29 claims
- 0284US6475920B2Plasma etching method using low ionization potential gasMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 5, 2002·28 cites·36 claims
- 0376US4226896APlasma method for forming a metal containing polymerIBM·Filed 1977·Granted Oct 7, 1980·28 cites·8 claims
- 0471US6228775B1Plasma etching method using low ionization potential gasMICRON TECHNOLOGY INC·Filed 1998·Granted May 8, 2001·35 cites·21 claims
- 0562US4162185AUtilizing saturated and unsaturated halocarbon gases in plasma etching to increase etch of SiO2 relative to SiIBM·Filed 1978·Granted Jul 24, 1979·20 cites·9 claims
- 0657US4331504AEtching process with vibrationally excited SF6IBM·Filed 1981·Granted May 25, 1982·22 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →