Inventor · disambiguated record
Kiyohiko Toshikawa
Also filed as: TOSHIKAWA KIYOHIKO
10 granted patents·3 pending applications·45 citations·filing 2001–2020
85Inventor score
Top patents by PatentIndex Score
13 records- 0173US10892165B2Semiconductor manufacturing device and method of polishing semiconductor substrateLAPIS SEMICONDUCTOR CO LTD·Filed 2018·Granted Jan 12, 2021·1 cites·7 claims
- 0271US6656854B2Method of forming a low dielectric constant film with tetramethylcyclotetrasiloxane (TMCTS) and LPCVD techniqueOKI ELECTRIC IND CO LTD·Filed 2002·Granted Dec 2, 2003·15 cites·19 claims
- 0371US6627560B1Method of manufacturing semiconductor deviceOKI ELECTRIC IND CO LTD·Filed 2002·Granted Sep 30, 2003·15 cites·19 claims
- 0465US11894235B2Semiconductor manufacturing device and method of polishing semiconductor substrateLAPIS SEMICONDUCTOR CO LTD·Filed 2020·Granted Feb 6, 2024·0 cites·5 claims
- 0557US7381275B2Apparatus and method for manufacturing semiconductorOKI ELECTRIC IND CO LTD·Filed 2002·Granted Jun 3, 2008·3 cites·15 claims
- 0655US6926933B2Method of manufacturing water-repelling filmOKI ELECTRIC IND CO LTD·Filed 2003·Granted Aug 9, 2005·5 cites·6 claims
- 0754US7267848B2Method of fabricating a protective film by use of vacuum ultraviolet raysOKI ELECTRIC IND CO LTD·Filed 2003·Granted Sep 11, 2007·2 cites·4 claims
- 0854US6624094B2Method of manufacturing an interlayer dielectric film using vacuum ultraviolet CVD with Xe2 excimer lamp and silicon atomsOKI ELECTRIC IND CO LTD·Filed 2001·Granted Sep 23, 2003·4 cites·11 claims
- 0944US7122486B2Film forming methodOKI ELECTRIC IND CO LTD·Filed 2004·Granted Oct 17, 2006·0 cites·11 claims
- 1043US2002182845A1Method of filling a concave portion with an insulating materialFiled 2002·Application pending·0 cites
- 1140US2002142095A1Method of forming a film by vacuum ultraviolet irradiationFiled 2002·Application pending·0 cites
- 1238US2003119234A1Method of filling a concave portion with an insulating materialFiled 2002·Application pending·0 cites
- 1330US7026257B2Method of manufacturing low dielectric film by a vacuum ultraviolet chemical vapor depositionOKI ELECTRIC IND CO LTD·Filed 2001·Granted Apr 11, 2006·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →