Inventor · disambiguated record
Saurabh Ullal
Also filed as: ULLAL SAURABH · ULLAL SAURABH J
26 granted patents·8 pending applications·503 citations·filing 2002–2023
97Inventor score
Top patents by PatentIndex Score
34 records- 0197US11471941B2Process for producing spheroidized powder from feedstock materials6K INC·Filed 2020·Granted Oct 18, 2022·17 cites·7 claims
- 0297US11465201B2Process for producing spheroidized powder from feedstock materials6K INC·Filed 2020·Granted Oct 11, 2022·17 cites·19 claims
- 0397US11273491B2Process for producing spheroidized powder from feedstock materials6K INC·Filed 2020·Granted Mar 15, 2022·19 cites·18 claims
- 0496US7854820B2Upper electrode backing member with particle reducing featuresLAM RES CORP·Filed 2006·Granted Dec 21, 2010·38 cites·7 claims
- 0595US10639712B2Process for producing spheroidized powder from feedstock materialsAMASTAN TECH INC·Filed 2019·Granted May 5, 2020·29 cites·28 claims
- 0695US7939778B2Plasma processing chamber with guard ring for upper electrode assemblyLAM RES CORP·Filed 2009·Granted May 10, 2011·27 cites·20 claims
- 0795US7204913B1In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition controlLAM RES CORP·Filed 2003·Granted Apr 17, 2007·92 cites·6 claims
- 0893US12261023B2Microwave plasma apparatus and methods for processing materials using an interior liner6K INC·Filed 2023·Granted Mar 25, 2025·1 cites·14 claims
- 0993US7767584B1In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition controlLAM RES CORP·Filed 2007·Granted Aug 3, 2010·45 cites·7 claims
- 1093US7482550B2Quartz guard ringLAM RES CORP·Filed 2007·Granted Jan 27, 2009·18 cites·19 claims
- 1193US6776851B1In-situ cleaning of a polymer coated plasma processing chamberLAM RES CORP·Filed 2002·Granted Aug 17, 2004·49 cites·13 claims
- 1291US9728429B2Parasitic plasma prevention in plasma processing chambersRICCI ANTHONY·Filed 2010·Granted Aug 8, 2017·51 cites·15 claims
- 1390US8410393B2Apparatus and method for temperature control of a semiconductor substrate supportRICCI ANTHONY·Filed 2010·Granted Apr 2, 2013·16 cites·24 claims
- 1490US7862682B2Showerhead electrode assemblies for plasma processing apparatusesLAM RES CORP·Filed 2007·Granted Jan 4, 2011·32 cites·16 claims
- 1586US8702866B2Showerhead electrode assembly with gas flow modification for extended electrode lifeAUGUSTINO JASON·Filed 2006·Granted Apr 22, 2014·10 cites·19 claims
- 1683US12311447B2Process for producing spheroidized powder from feedstock materials6K INC·Filed 2022·Granted May 27, 2025·0 cites·15 claims
- 1776US6994769B2In-situ cleaning of a polymer coated plasma processing chamberLAM RES CORP·Filed 2004·Granted Feb 7, 2006·25 cites·9 claims
- 1873US2023001376A1Systems, methods, and devices for producing a material with desired characteristics using microwave plasma6K INC·Filed 2022·Application pending·0 cites
- 1972US2023001375A1Systems, methods, and devices for producing a material with desired characteristics using microwave plasma6K INC·Filed 2022·Application pending·0 cites
- 2071US8709202B2Upper electrode backing member with particle reducing featuresDE LA LLERA ANTHONY·Filed 2010·Granted Apr 29, 2014·2 cites·11 claims
- 2171US2024057245A1Microwave plasma apparatus and methods for processing feed material utiziling multiple microwave plasma applicators6K INC·Filed 2023·Application pending·0 cites
- 2269US7682980B2Method to improve profile control and N/P loading in dual doped gate applicationsLAM RES CORP·Filed 2007·Granted Mar 23, 2010·3 cites·10 claims
- 2368US8797705B2Methods and arrangement for plasma dechuck optimization based on coupling of plasma signaling to substrate position and potentialVALCORE JR JOHN C·Filed 2009·Granted Aug 5, 2014·3 cites·20 claims
- 2468US2023247751A1Microwave plasma apparatus and methods for processing feed material utiziling multiple microwave plasma applicators6K INC·Filed 2023·Application pending·0 cites
- 2567US9076826B2Plasma confinement ring assembly for plasma processing chambersDE LA LLERA ANTHONY·Filed 2011·Granted Jul 7, 2015·2 cites·23 claims
- 2663US8143904B2System and method for testing an electrostatic chuckSHIH HONG·Filed 2008·Granted Mar 27, 2012·1 cites·10 claims
- 2758US7186661B2Method to improve profile control and N/P loading in dual doped gate applicationsLAM RES CORP·Filed 2003·Granted Mar 6, 2007·6 cites·3 claims
- 2853US9093483B2Showerhead electrode assembly with gas flow modification for extended electrode lifeLAM RES CORP·Filed 2014·Granted Jul 28, 2015·0 cites·17 claims
- 2953US2014261158A1Furnance employing components for use with graphite hot zoneADVANCED RENEWABLEENERGY COMPANY LLC·Filed 2014·Application pending·0 cites
- 3051US9082805B2System and method for testing an electrostatic chuckSHIH HONG·Filed 2012·Granted Jul 14, 2015·0 cites·6 claims
- 3149US2008087641A1Components for a plasma processing apparatusLAM RES CORP·Filed 2006·Application pending·0 cites
- 3248US2011024049A1Light-up prevention in electrostatic chucksC O LAM RES CORP·Filed 2009·Application pending·0 cites
- 3343US8313665B2Showerhead electrode assemblies for plasma processing apparatusesSTEVENSON THOMAS R·Filed 2010·Granted Nov 20, 2012·0 cites·11 claims
- 3443US2003005943A1High pressure wafer-less auto clean for etch applicationsLAM RES CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →