Inventor · disambiguated record
Hideo Eto
Also filed as: ETO HIDEO
18 granted patents·16 pending applications·114 citations·filing 2002–2020
92Inventor score
Top patents by PatentIndex Score
34 records- 0192US8833388B2Pressure controlling apparatusETO HIDEO·Filed 2012·Granted Sep 16, 2014·19 cites·15 claims
- 0287US6903815B2Optical waveguide sensor, device, system and method for glucose measurementTOSHIBA KK·Filed 2002·Granted Jun 7, 2005·34 cites·20 claims
- 0384US9236229B2Gas supply member, plasma treatment method, and method of forming yttria-containing filmETO HIDEO·Filed 2011·Granted Jan 12, 2016·8 cites·15 claims
- 0480US10818535B2Plasma processing-apparatus processing object support platform, plasma processing apparatus, and plasma processing methodTOSHIBA MEMORY CORP·Filed 2018·Granted Oct 27, 2020·2 cites·9 claims
- 0577US7054514B2Optical waveguide sensor, device, system and method for glucose measurementTOSHIBA KK·Filed 2005·Granted May 30, 2006·19 cites·8 claims
- 0676US9370920B2Electrostatic chuck, mount plate support, and manufacturing method of electrostatic chuckTOSHIBA KK·Filed 2014·Granted Jun 21, 2016·3 cites·18 claims
- 0774US10280121B2Silicon carbide member for plasma processing apparatusHOKURIKU SEIKEI IND CO LTD·Filed 2016·Granted May 7, 2019·2 cites·1 claims
- 0873US7498145B2Concentration measuring method, concentration measuring kit, and sensor chip for use in the methodTOSHIBA KK·Filed 2006·Granted Mar 3, 2009·14 cites·16 claims
- 0962US7678567B2Optical biosensorTOSHIBA KK·Filed 2004·Granted Mar 16, 2010·4 cites·13 claims
- 1058US8689623B2Flow sensor, mass flow controller, and method for manufacturing flow sensorETO HIDEO·Filed 2012·Granted Apr 8, 2014·1 cites·8 claims
- 1156US6767078B2Ink jet head having a nozzle plateTOSHIBA KK·Filed 2002·Granted Jul 27, 2004·6 cites·5 claims
- 1255US11482443B2Bonding apparatus and bonding methodKIOXIA CORP·Filed 2020·Granted Oct 25, 2022·0 cites·20 claims
- 1355US2014231018A1Plasma processing apparatusTOSHIBA KK·Filed 2014·Application pending·0 cites
- 1452US2010051475A1Machining electrode, electrochemical machining apparatus, electrochemical machining method and method for manufacturing structure bodyTOSHIBA KK·Filed 2009·Application pending·0 cites
- 1549US2012040132A1Protective film, method for forming the same, semiconductor manufacturing apparatus, and plasma treatment apparatusETO HIDEO·Filed 2011·Application pending·0 cites
- 1648US7410614B2Optical waveguide type iontophoresis sensor chip and method for packaging sensor chipTOSHIBA KK·Filed 2004·Granted Aug 12, 2008·2 cites·6 claims
- 1748US2013008603A1Coaxial cable and substrate processing apparatusTOSHIBA KK·Filed 2012·Application pending·0 cites
- 1848US2018012784A1Plasma processing-apparatus processing object support platform, plasma processing apparatus, and plasma processing methodTOSHIBA MEMORY CORP·Filed 2016·Application pending·0 cites
- 1946US8760053B2Power supply control device, plasma processing device, and plasma processing methodETO HIDEO·Filed 2011·Granted Jun 24, 2014·0 cites·20 claims
- 2046US2005084909A1Antigen measuring device and method thereof, an antibody chip package and a palletFiled 2004·Application pending·0 cites
- 2145US9111969B2Seal member, etching apparatus, and a method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2013·Granted Aug 18, 2015·0 cites·12 claims
- 2245US2015143146A1Substrate processing apparatus and control methodTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2344US2016284522A1Upper electrode, edge ring, and plasma processing apparatusTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2443US11094574B2Substrate supporting device and plasma processing apparatusTOSHIBA MEMORY CORP·Filed 2019·Granted Aug 17, 2021·0 cites·21 claims
- 2542US10115615B2Substrate processing apparatus and control method of substrate processing apparatusTOSHIBA MEMORY CORP·Filed 2016·Granted Oct 30, 2018·0 cites·11 claims
- 2640US2014231251A1Gas supply member, plasma processing apparatus and method of fabricating gas supply memberTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2740US2014217891A1Electrode for plasma processing apparatus, method for manufacturing the same, and plasma processing apparatusTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2839US2012000607A1Mass flow control system, plasma processing apparatus, and flow control methodITO ATSUSHI·Filed 2011·Application pending·0 cites
- 2939US2012000887A1Plasma treatment apparatus and plasma treatment methodETO HIDEO·Filed 2011·Application pending·0 cites
- 3038US8651135B2Mass flow controller, mass flow controller system, substrate processing device, and gas flow rate adjusting methodETO HIDEO·Filed 2011·Granted Feb 18, 2014·0 cites·7 claims
- 3138US2012216955A1Plasma processing apparatusETO HIDEO·Filed 2012·Application pending·0 cites
- 3238US2013168020A1Etching device and focus ringTOSHIBA KK·Filed 2012·Application pending·0 cites
- 3338US2018261481A1Sensing system, sensing wafer, and plasma processing apparatusTOSHIBA MEMORY CORP·Filed 2017·Application pending·0 cites
- 3431US2012247667A1Plasma treatment apparatusHASHIGUCHI HISASHI·Filed 2011·Application pending·0 cites
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