Inventor · disambiguated record
Richard Fovell
Also filed as: FOVELL RICHARD · FOVELL RICHARD C · FOVELL RICHARD CHARLES
47 granted patents·9 pending applications·585 citations·filing 1988–2024
98Inventor score
Files withAPPLIED MATERIALS INC40BUCHBERGER JR DOUGLAS A6BRILLHART PAUL LUKAS5ALTEN CORP1BUCHBERGER DOUGLAS A1
Top patents by PatentIndex Score
56 records- 0197US11670489B2Modular microwave source with embedded ground surfaceAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·4 cites·10 claims
- 0296US8092639B2Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changesBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Jan 10, 2012·20 cites·7 claims
- 0396US8012304B2Plasma reactor with a multiple zone thermal control feed forward control apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·27 cites·11 claims
- 0495US11049694B2Modular microwave source with embedded ground surfaceAPPLIED MATERIALS INC·Filed 2019·Granted Jun 29, 2021·12 cites·20 claims
- 0595US7846497B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Dec 7, 2010·37 cites·21 claims
- 0694US9745663B2Symmetrical inductively coupled plasma source with symmetrical flow chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 29, 2017·8 cites·18 claims
- 0794US8608900B2Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changesBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Dec 17, 2013·18 cites·20 claims
- 0893US8329586B2Method of processing a workpiece in a plasma reactor using feed forward thermal controlBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Dec 11, 2012·11 cites·18 claims
- 0993US8221580B2Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loopsBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Jul 17, 2012·14 cites·18 claims
- 1093US7775236B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·25 cites·20 claims
- 1192US8980044B2Plasma reactor with a multiple zone thermal control feed forward control apparatusBRILLHART PAUL LUKAS·Filed 2010·Granted Mar 17, 2015·10 cites·19 claims
- 1292US8337660B2Capacitively coupled plasma reactor having very agile wafer temperature controlBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Dec 25, 2012·12 cites·13 claims
- 1392US8021521B2Method for agile workpiece temperature control in a plasma reactor using a thermal modelAPPLIED MATERIALS INC·Filed 2006·Granted Sep 20, 2011·13 cites·19 claims
- 1492US6916399B1Temperature controlled window with a fluid supply systemAPPLIED MATERIALS INC·Filed 1999·Granted Jul 12, 2005·168 cites·20 claims
- 1591US10170279B2Multiple coil inductively coupled plasma source with offset frequencies and double-walled shieldingAPPLIED MATERIALS INC·Filed 2014·Granted Jan 1, 2019·11 cites·14 claims
- 1691US8157951B2Capacitively coupled plasma reactor having very agile wafer temperature controlBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Apr 17, 2012·18 cites·16 claims
- 1791US7988872B2Method of operating a capacitively coupled plasma reactor with dual temperature control loopsAPPLIED MATERIALS INC·Filed 2006·Granted Aug 2, 2011·19 cites·20 claims
- 1890US10249470B2Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shieldingAPPLIED MATERIALS INC·Filed 2013·Granted Apr 2, 2019·10 cites·13 claims
- 1990US8034180B2Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactorAPPLIED MATERIALS INC·Filed 2006·Granted Oct 11, 2011·14 cites·6 claims
- 2090US7975558B2Method and apparatus for gas flow measurementAPPLIED MATERIALS INC·Filed 2010·Granted Jul 12, 2011·9 cites·22 claims
- 2189US8092638B2Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distributionBRILLHART PAUL LUKAS·Filed 2006·Granted Jan 10, 2012·15 cites·9 claims
- 2288US10811226B2Symmetrical plural-coil plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2018·Granted Oct 20, 2020·4 cites·21 claims
- 2387US11043360B2Gas distribution plate assembly for high power plasma etch processesAPPLIED MATERIALS INC·Filed 2017·Granted Jun 22, 2021·4 cites·18 claims
- 2487US8546267B2Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal controlBRILLHART PAUL LUKAS·Filed 2010·Granted Oct 1, 2013·5 cites·7 claims
- 2587US8074677B2Method and apparatus for controlling gas flow to a processing chamberGOLD EZRA ROBERT·Filed 2007·Granted Dec 13, 2011·19 cites·20 claims
- 2687US7743670B2Method and apparatus for gas flow measurementAPPLIED MATERIALS INC·Filed 2007·Granted Jun 29, 2010·10 cites·20 claims
- 2786US10131994B2Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flowAPPLIED MATERIALS INC·Filed 2012·Granted Nov 20, 2018·4 cites·13 claims
- 2886US9928987B2Inductively coupled plasma source with symmetrical RF feedAPPLIED MATERIALS INC·Filed 2013·Granted Mar 27, 2018·5 cites·16 claims
- 2986US9896769B2Inductively coupled plasma source with multiple dielectric windows and window-supporting structureAPPLIED MATERIALS INC·Filed 2012·Granted Feb 20, 2018·4 cites·15 claims
- 3086US9082590B2Symmetrical inductively coupled plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2013·Granted Jul 14, 2015·8 cites·19 claims
- 3185US10780447B2Apparatus for controlling temperature uniformity of a showerheadAPPLIED MATERIALS INC·Filed 2017·Granted Sep 22, 2020·4 cites·20 claims
- 3282US12191118B2Monolithic modular microwave source with integrated process gas distributionAPPLIED MATERIALS INC·Filed 2024·Granted Jan 7, 2025·0 cites·20 claims
- 3382US11881384B2Monolithic modular microwave source with integrated process gas distributionAPPLIED MATERIALS INC·Filed 2019·Granted Jan 23, 2024·2 cites·19 claims
- 3482US8801893B2Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactorBRILLHART PAUL LUKAS·Filed 2010·Granted Aug 12, 2014·5 cites·16 claims
- 3579US9870897B2Symmetrical plural-coil plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2014·Granted Jan 16, 2018·4 cites·20 claims
- 3678US12144090B2Monolithic modular microwave source with integrated temperature controlAPPLIED MATERIALS INC·Filed 2022·Granted Nov 12, 2024·0 cites·15 claims
- 3774US4960569ACorona discharge ozonator with cooled flow pathALTEN CORP·Filed 1988·Granted Oct 2, 1990·26 cites·10 claims
- 3873US11564292B2Monolithic modular microwave source with integrated temperature controlAPPLIED MATERIALS INC·Filed 2019·Granted Jan 24, 2023·1 cites·15 claims
- 3972US8895889B2Methods and apparatus for rapidly responsive heat control in plasma processing devicesAPPLIED MATERIALS INC·Filed 2013·Granted Nov 25, 2014·2 cites·8 claims
- 4070US10537013B2Distributed electro-static chuck coolingAPPLIED MATERIALS INC·Filed 2013·Granted Jan 14, 2020·2 cites·18 claims
- 4166US2019085467A1Plasma Reactor Having Radial Struts for Substrate SupportAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4263US2017350017A1Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow ChamberAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 4363US2017350018A1Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting StructureAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 4460US2018218873A1Inductively coupled plasma source with symmetrical rf feed and reactance elementsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4560US2018211811A1Plasma source with symmetrical rf feedAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4659US2009159566A1Method and apparatus for controlling temperature of a substrateAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4758US10395904B2Method of real time in-situ chamber condition monitoring using sensors and RF communicationAPPLIED MATERIALS INC·Filed 2018·Granted Aug 27, 2019·0 cites·15 claims
- 4857US10141166B2Method of real time in-situ chamber condition monitoring using sensors and RF communicationAPPLIED MATERIALS INC·Filed 2014·Granted Nov 27, 2018·0 cites·13 claims
- 4956US12033835B2Modular microwave source with multiple metal housingsAPPLIED MATERIALS INC·Filed 2020·Granted Jul 9, 2024·0 cites·12 claims
- 5055US9155134B2Methods and apparatus for rapidly responsive heat control in plasma processing devicesZHANG CHUNLEI·Filed 2008·Granted Oct 6, 2015·0 cites·16 claims
Showing the top 50 of 56 patent records by PatentIndex Score.
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