Inventor · disambiguated record
Masahiko Kakizawa
Also filed as: KAKIZAWA MASAHIKO
13 granted patents·7 pending applications·712 citations·filing 1992–2014
94Inventor score
Files withWAKO PURE CHEM IND LTD14MIZUTA HIRONORI3KAWADA HIROMI1MIMASU SEMICONDUCTOR IND CO1WAKO PURE CHEMCIAL IND LTD1
Top patents by PatentIndex Score
20 records- 0194US6514921B1Cleaning agentWAKO PURE CHEM IND LTD·Filed 2000·Granted Feb 4, 2003·77 cites·17 claims
- 0293US6310019B1Cleaning agent for a semi-conductor substrateWAKO PURE CHEM IND LTD·Filed 2000·Granted Oct 30, 2001·65 cites·9 claims
- 0392US5290361ASurface treating cleaning methodWAKO PURE CHEM IND LTD·Filed 1992·Granted Mar 1, 1994·273 cites·8 claims
- 0491US6534458B1Cleaning agent for a semi-conductor substrateWAKO PURE CHEM IND LTD·Filed 2000·Granted Mar 18, 2003·55 cites·22 claims
- 0588US6410494B2Cleaning agentWAKO PURE CHEM IND LTD·Filed 2001·Granted Jun 25, 2002·42 cites·22 claims
- 0687US6143705ACleaning agentWAKO PURE CHEM IND LTD·Filed 1997·Granted Nov 7, 2000·75 cites·2 claims
- 0783US7375066B2Semiconductor wafer cleaning agent and cleaning methodWAKO PURE CHEM IND LTD·Filed 2001·Granted May 20, 2008·25 cites·31 claims
- 0881US5580846ASurface treating agents and treating process for semiconductorsWAKO PURE CHEM IND LTD·Filed 1995·Granted Dec 3, 1996·53 cites·9 claims
- 0976US6716803B2Cleaning agent for a semi-conductor substrateWAKO PURE CHEMCIAL IND LTD·Filed 2001·Granted Apr 6, 2004·18 cites·1 claims
- 1068US8900371B2Cleaning agent for substrate and cleaning methodMIZUTA HIRONORI·Filed 2011·Granted Dec 2, 2014·2 cites·7 claims
- 1165US9845538B2Etching agent, etching method and etching agent preparation liquidWAKO PURE CHEM IND LTD·Filed 2014·Granted Dec 19, 2017·2 cites·10 claims
- 1264US5840127ASurface treating agents and treating process for semiconductorsWAKO PURE CHEM IND LTD·Filed 1996·Granted Nov 24, 1998·25 cites·4 claims
- 1354US2015125985A1Etching fluid and production method for silicon-based substrate using sameWAKO PURE CHEM IND LTD·Filed 2013·Application pending·0 cites
- 1450US2010269903A1Process for producing polycrystalline silicon substrate and polycrystalline silicon substrateMIMASU SEMICONDUCTOR IND CO·Filed 2008·Application pending·0 cites
- 1545US2009227115A1Etching solution for substrateWAKO PURE CHEM IND LTD·Filed 2007·Application pending·0 cites
- 1642US2004077512A1Cleaning agent for a semi-conductor substrateWAKO PURE CHEM IND LTD·Filed 2003·Application pending·0 cites
- 1742US2007235061A1Cleaning Agent for Substrate and Cleaning MethodWAKO PURE CHEM IND LTD·Filed 2004·Application pending·0 cites
- 1836US9006164B2Resist remover composition and method for removing resist using the compositionMIZUTA HIRONORI·Filed 2010·Granted Apr 14, 2015·0 cites·16 claims
- 1936US2013171835A1Composition for water-repellent treatment of surface, and method for water-repellent treatment of surface of semiconductor substrate using sameMIZUTA HIRONORI·Filed 2011·Application pending·0 cites
- 2030US2013261040A1Substrate cleaner for copper wiring, and method for cleaning copper wiring semiconductor substrateKAWADA HIROMI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →