Inventor · disambiguated record
Hideo Takami
Also filed as: TAKAMI HIDEO
25 granted patents·17 pending applications·173 citations·filing 1999–2022
95Inventor score
Files withJX NIPPON MINING & METALS CORP14TAKAMI HIDEO8NIPPON MINING CO7IKISAWA MASAKATSU3IKEDA YUKI2
Top patents by PatentIndex Score
42 records- 0192US7718095B2Sputtering target, thin film for optical information recording medium and process for producing the sameNIPPON MINING CO·Filed 2008·Granted May 18, 2010·10 cites·9 claims
- 0290US7484546B2Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the targetNIPPON MINING CO·Filed 2006·Granted Feb 3, 2009·9 cites·17 claims
- 0387US7635440B2Sputtering target, thin film for optical information recording medium and process for producing the sameNIPPON MINING CO·Filed 2004·Granted Dec 22, 2009·22 cites·20 claims
- 0486US9567665B2Sputtering target for magnetic recording film, and process for producing sameTAKAMI HIDEO·Filed 2011·Granted Feb 14, 2017·4 cites·16 claims
- 0583US8771557B2Indium oxide sintered compact, indium oxide transparent conductive film, and manufacturing method of indium oxide transparent conductive filmTAKAMI HIDEO·Filed 2010·Granted Jul 8, 2014·2 cites·5 claims
- 0683US8758497B2Sputtering target of sintered Ti—Nb based oxide, thin film of Ti—Nb based oxide, and method of producing the thin filmTAKAMI HIDEO·Filed 2010·Granted Jun 24, 2014·4 cites·2 claims
- 0782US7897068B2Sputtering target, thin film for optical information recording medium and process for producing the sameJX NIPPON MINING & METALS CORP·Filed 2010·Granted Mar 1, 2011·4 cites·16 claims
- 0882US7156964B2Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the targetNIPPON MINING CO·Filed 2002·Granted Jan 2, 2007·20 cites·2 claims
- 0981US7892457B2Sputtering target, thin film for optical information recording medium and process for producing the sameJX NIPPON MINING & METALS CORP·Filed 2010·Granted Feb 22, 2011·1 cites·12 claims
- 1081US6528442B1Optical transparent film and sputtering target for forming optical transparent filmNIKKO MATERIALS CO LTD·Filed 1999·Granted Mar 4, 2003·65 cites·7 claims
- 1180US7279211B2Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering targetNIPPON MINING CO·Filed 2002·Granted Oct 9, 2007·19 cites·19 claims
- 1279US12198911B2Nonmagnetic material-dispersed Fe-Pt based sputtering targetJX ADVANCED METALS CORP·Filed 2022·Granted Jan 14, 2025·0 cites·9 claims
- 1377US11651790B2Thin film comprising titanium oxide, and method of producing thin film comprising titanium oxideJX NIPPON MINING & METALS CORP·Filed 2021·Granted May 16, 2023·0 cites·6 claims
- 1472US8501052B2Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main componentTAKAMI HIDEO·Filed 2010·Granted Aug 6, 2013·2 cites·9 claims
- 1572US7344660B2Sputtering target and process for producing the sameNIPPON MINING CO·Filed 2004·Granted Mar 18, 2008·10 cites·20 claims
- 1666US10037830B2Indium oxide transparent conductive filmJX NIPPON MINING & METALS CORP·Filed 2017·Granted Jul 31, 2018·0 cites·3 claims
- 1765US9761422B2Magnetic material sputtering target and manufacturing method for sameJX NIPPON MINING & METALS CORP·Filed 2013·Granted Sep 12, 2017·1 cites·14 claims
- 1864US2012196076A1Thin Film Comprising Titanium Oxide as Main Component and Sintered Compact Sputtering Target Comprising Titanium Oxide as Main ComponentTAKAMI HIDEO·Filed 2012·Application pending·0 cites
- 1964US2012192763A1Thin Film Comprising Titanium Oxide as Main Component and Sintered Compact Sputtering Target Comprising Titanium Oxide as Main ComponentTAKAMI HIDEO·Filed 2012·Application pending·0 cites
- 2063US9589695B2Indium oxide transparent conductive filmJX NIPPON MINING & METALS CORP·Filed 2014·Granted Mar 7, 2017·0 cites·6 claims
- 2162US2019185987A1Nonmagnetic material-dispersed fe-pt based sputtering targetJX NIPPON MINING & METALS CORP·Filed 2017·Application pending·0 cites
- 2260US9732414B2Co—Cr—Pt-based sputtering target and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2012·Granted Aug 15, 2017·0 cites·14 claims
- 2360US2015162045A1Thin Film Comprising Titanium Oxide, and Method of Producing Thin Film Comprising Titanium OxideJX NIPPON MINING & METALS CORP·Filed 2015·Application pending·0 cites
- 2459US2010276276A1Thin Film Mainly Comprising Titanium Oxide, Sintered Sputtering Target Suitable for Producing Thin Film Mainly Comprising Titanium Oxide, and Method of Producing Thin Film Mainly Comprising Titanium OxideNIPPON MINING AND METALS CO LT·Filed 2008·Application pending·0 cites
- 2556US2014023868A1Sputtering Target of Sintered Ti-Nb Based Oxide, Thin Film of Ti-Nb Based Oxide, and Method of Producing The Thin FilmJX NIPPON MINING & METALS CORP·Filed 2013·Application pending·0 cites
- 2655US2007297932A1Process for Production of Ge-Cr Alloy Sputtering TargetNIPPON MINING CO·Filed 2007·Application pending·0 cites
- 2753US9605339B2Sputtering target for magnetic recording film and process for production thereofOGINO SHIN-ICHI·Filed 2011·Granted Mar 28, 2017·0 cites·20 claims
- 2853US9273389B2Cu—In—Ga—Se quaternary alloy sputtering targetTAMURA TOMOYA·Filed 2011·Granted Mar 1, 2016·0 cites·8 claims
- 2951US9773653B2Ferromagnetic material sputtering target containing chromium oxideJX NIPPON MINING & METALS CORP·Filed 2013·Granted Sep 26, 2017·0 cites·5 claims
- 3051US2014360871A1Fe-Pt-Ag-C-Based Sputtering Target Having C Grains Dispersed Therein, and Method for Producing SameJX NIPPON MINING & METALS CORP·Filed 2013·Application pending·0 cites
- 3150US8877021B2Chromic oxide powder for sputtering target, and sputtering target manufactured from such chromic oxide powderTAKAMI HIDEO·Filed 2006·Granted Nov 4, 2014·0 cites·5 claims
- 3249US9214253B2Sintered compact of indium oxide system, and transparent conductive film of indium oxide systemIKISAWA MASAKATSU·Filed 2010·Granted Dec 15, 2015·0 cites·6 claims
- 3348US9663405B2Oxide sintered compact, its production method, and raw material powder for producing oxide sintered compactIKISAWA MASAKATSU·Filed 2010·Granted May 30, 2017·0 cites·3 claims
- 3445US2012205242A1Cu-In-Ga-Se QUATERNARY ALLOY SPUTTERING TARGETTAMURA TOMOYA·Filed 2010·Application pending·0 cites
- 3544US2012286219A1Sputtering target, semiconducting compound film, solar cell comprising semiconducting compound film, and method of producing semiconducting compound filmIKISAWA MASAKATSU·Filed 2010·Application pending·0 cites
- 3644US2013134038A1Ferromagnetic Material Sputtering TargetSATO ATSUSHI·Filed 2011·Application pending·0 cites
- 3743US2015014155A1Ferromagnetic Material Sputtering Target Containing Chromium OxideJX NIPPON MINING & METALS CORP·Filed 2013·Application pending·0 cites
- 3843US2006086610A1Ge-cr alloy sputtering target and process for producing the sameNIKKO MATERIALS CO LTD·Filed 2003·Application pending·0 cites
- 3943US2011036710A1Ge-Cr Alloy Sputtering TargetJX NIPPON MINING & METALS CORP·Filed 2010·Application pending·0 cites
- 4042US2013206591A1Sputtering Target for Magnetic Recording Film and Method for Producing SameTAKAMI HIDEO·Filed 2011·Application pending·0 cites
- 4140US2013292245A1FE-PT-Based Ferromagnetic Sputtering Target and Method for Producing SameIKEDA YUKI·Filed 2011·Application pending·0 cites
- 4240US2013175167A1Ferromagnetic sputtering target and method for manufacturing sameIKEDA YUKI·Filed 2011·Application pending·0 cites
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