Assignee
TAKAMI HIDEO
JP·5 granted patents·3 pending applications·12 citations·filing 2006–2012
Top patents by PatentIndex Score
8 records- 0186US9567665B2Sputtering target for magnetic recording film, and process for producing sameTAKAMI HIDEO·Filed 2011·Granted Feb 14, 2017·4 cites·16 claims
- 0283US8771557B2Indium oxide sintered compact, indium oxide transparent conductive film, and manufacturing method of indium oxide transparent conductive filmTAKAMI HIDEO·Filed 2010·Granted Jul 8, 2014·2 cites·5 claims
- 0383US8758497B2Sputtering target of sintered Ti—Nb based oxide, thin film of Ti—Nb based oxide, and method of producing the thin filmTAKAMI HIDEO·Filed 2010·Granted Jun 24, 2014·4 cites·2 claims
- 0472US8501052B2Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main componentTAKAMI HIDEO·Filed 2010·Granted Aug 6, 2013·2 cites·9 claims
- 0564US2012196076A1Thin Film Comprising Titanium Oxide as Main Component and Sintered Compact Sputtering Target Comprising Titanium Oxide as Main ComponentTAKAMI HIDEO·Filed 2012·Application pending·0 cites
- 0664US2012192763A1Thin Film Comprising Titanium Oxide as Main Component and Sintered Compact Sputtering Target Comprising Titanium Oxide as Main ComponentTAKAMI HIDEO·Filed 2012·Application pending·0 cites
- 0750US8877021B2Chromic oxide powder for sputtering target, and sputtering target manufactured from such chromic oxide powderTAKAMI HIDEO·Filed 2006·Granted Nov 4, 2014·0 cites·5 claims
- 0842US2013206591A1Sputtering Target for Magnetic Recording Film and Method for Producing SameTAKAMI HIDEO·Filed 2011·Application pending·0 cites
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