Inventor · disambiguated record
Ken Ninomiya
Also filed as: NINOMIYA KEN
26 granted patents·1,969 citations·filing 1981–1999
98Inventor score
Files withHITACHI LTD26
Top patents by PatentIndex Score
26 records- 0199US4579623AMethod and apparatus for surface treatment by plasmaHITACHI LTD·Filed 1984·Granted Apr 1, 1986·654 cites·33 claims
- 0298US5412210AScanning electron microscope and method for production of semiconductor device by using the sameHITACHI LTD·Filed 1993·Granted May 2, 1995·148 cites·70 claims
- 0398US4481229AMethod for growing silicon-including film by employing plasma depositionHITACHI LTD·Filed 1983·Granted Nov 6, 1984·143 cites·15 claims
- 0496US5481109ASurface analysis method and apparatus for carrying out the sameHITACHI LTD·Filed 1993·Granted Jan 2, 1996·121 cites·80 claims
- 0595US4901667ASurface treatment apparatusHITACHI LTD·Filed 1986·Granted Feb 20, 1990·103 cites·17 claims
- 0695US4522674ASurface treatment apparatusHITACHI LTD·Filed 1984·Granted Jun 11, 1985·71 cites·10 claims
- 0794US4559100AMicrowave plasma etching apparatusHITACHI LTD·Filed 1984·Granted Dec 17, 1985·43 cites·8 claims
- 0893US6114695AScanning electron microscope and method for dimension measuring by using the sameHITACHI LTD·Filed 1999·Granted Sep 5, 2000·62 cites·4 claims
- 0993US4433228AMicrowave plasma sourceHITACHI LTD·Filed 1981·Granted Feb 21, 1984·43 cites·20 claims
- 1091US5594245AScanning electron microscope and method for dimension measuring by using the sameHITACHI LTD·Filed 1995·Granted Jan 14, 1997·71 cites·20 claims
- 1188US5969357AScanning electron microscope and method for dimension measuring by using the sameHITACHI LTD·Filed 1997·Granted Oct 19, 1999·43 cites·20 claims
- 1284US4462863AMicrowave plasma etchingHITACHI LTD·Filed 1983·Granted Jul 31, 1984·59 cites·12 claims
- 1383US5877498AMethod and apparatus for X-ray analysesHITACHI LTD·Filed 1997·Granted Mar 2, 1999·42 cites·20 claims
- 1483US5866904AScanning electron microscope and method for dimension measuring by using the sameHITACHI LTD·Filed 1997·Granted Feb 2, 1999·42 cites·24 claims
- 1583US4658143AIon sourceHITACHI LTD·Filed 1985·Granted Apr 14, 1987·29 cites·33 claims
- 1672US5138158ASurface analysis method and apparatusHITACHI LTD·Filed 1989·Granted Aug 11, 1992·29 cites·52 claims
- 1771US5108543AMethod of surface treatmentHITACHI LTD·Filed 1988·Granted Apr 28, 1992·36 cites·12 claims
- 1870US5055679ASurface analysis method and apparatusHITACHI LTD·Filed 1990·Granted Oct 8, 1991·31 cites·34 claims
- 1969US5594246AMethod and apparatus for x-ray analysesHITACHI LTD·Filed 1995·Granted Jan 14, 1997·21 cites·75 claims
- 2068US6387235B1Apparatus for the separation and fractionation of differentially expressed gene fragmentsHITACHI LTD·Filed 1999·Granted May 14, 2002·31 cites·25 claims
- 2168US5220169ASurface analyzing method and apparatusHITACHI LTD·Filed 1990·Granted Jun 15, 1993·28 cites·40 claims
- 2267US5028778ASurface analysis method and a device thereforHITACHI LTD·Filed 1989·Granted Jul 2, 1991·23 cites·21 claims
- 2365US4705595AMethod for microwave plasma processingHITACHI LTD·Filed 1985·Granted Nov 10, 1987·32 cites·10 claims
- 2464US4624214ADry-processing apparatusHITACHI LTD·Filed 1985·Granted Nov 25, 1986·30 cites·9 claims
- 2557US4844767AMethod of and apparatus for etchingHITACHI LTD·Filed 1988·Granted Jul 4, 1989·25 cites·13 claims
- 2642US5115130ASurface measuring method and apparatusHITACHI LTD·Filed 1990·Granted May 19, 1992·9 cites·30 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →