Inventor · disambiguated record
Masaaki Muroi
Also filed as: MUROI MASAAKI
7 granted patents·3 pending applications·13 citations·filing 2003–2008
76Inventor score
Files withTOKYO OHKA KOGYO CO LTD6MARUZEN PETROCHEM CO LTD1MUROI MASAAKI1NAKAGAWA KOJI1OZAKI HIROKAZU1
Top patents by PatentIndex Score
10 records- 0176US7695889B2Copolymer for semiconductor lithography and process for production thereofMARUZEN PETROCHEM CO LTD·Filed 2006·Granted Apr 13, 2010·4 cites·18 claims
- 0254US7771911B2Process for producing photoresist composition, filter, coater and photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 10, 2010·7 cites·11 claims
- 0347US7276575B2Process for refining crude resin for resistTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Oct 2, 2007·1 cites·20 claims
- 0446US7312015B2Process for refining crude resin for electronic materialTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Dec 25, 2007·1 cites·14 claims
- 0543US7972762B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jul 5, 2011·0 cites·10 claims
- 0643US7879527B2Method of producing positive resist composition, positive resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Feb 1, 2011·0 cites·14 claims
- 0742US2009286178A1Process for producing resist composition, filtering apparatus, resist composition applicator, and resist compositionMUROI MASAAKI·Filed 2006·Application pending·0 cites
- 0839US2009155713A1Resist composition and process for producing sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 0937US2005227172A1Process for producing photoresist composition, filtration device, application device, and photoresist compositionOZAKI HIROKAZU·Filed 2005·Application pending·0 cites
- 1032US8409431B2Charging apparatusNAKAGAWA KOJI·Filed 2008·Granted Apr 2, 2013·0 cites·4 claims
Join the waitlist — get patent alerts
Get an alert when Masaaki Muroi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →