Inventor · disambiguated record
Koji Shirakawa
Also filed as: SHIRAKAWA KOJI
20 granted patents·6 pending applications·187 citations·filing 1995–2014
94Inventor score
Top patents by PatentIndex Score
26 records- 0197US8900791B2Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Dec 2, 2014·23 cites·21 claims
- 0293US8546063B2Organic solvent development or multiple development pattern-forming method using electron beams or EUV raysTSUBAKI HIDEAKI·Filed 2010·Granted Oct 1, 2013·10 cites·33 claims
- 0380US8637222B2Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist patternTSUCHIHASHI TORU·Filed 2010·Granted Jan 28, 2014·4 cites·16 claims
- 0479US6673512B1Negative-working resist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Jan 6, 2004·43 cites·41 claims
- 0577US5629128APositive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1995·Granted May 13, 1997·38 cites·10 claims
- 0663US6773862B2Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Aug 10, 2004·18 cites·16 claims
- 0762US2010224207A1Eyelash CurlerKOJI HONPO CO LTD·Filed 2008·Application pending·0 cites
- 0859US6489080B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Dec 3, 2002·19 cites·12 claims
- 0957US5639587APositive photoresist composition containing alkali soluble resins and quinonediazide ester mixtureFUJI PHOTO FILM CO LTD·Filed 1996·Granted Jun 17, 1997·17 cites·3 claims
- 1053US7326513B2Positive working resist compositionFUJIFILM CORP·Filed 2004·Granted Feb 5, 2008·3 cites·10 claims
- 1153US6727040B2Positive resist composition to be irradiated with one of an electron beam and X-rayFUJI PHOTO FILM CO LTD·Filed 2001·Granted Apr 27, 2004·3 cites·15 claims
- 1252US9034560B2Negative resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2014·Granted May 19, 2015·0 cites·13 claims
- 1351US2008241745A1Negative resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 1448US8080362B2Positive resist compositionSHIRAKAWA KOJI·Filed 2007·Granted Dec 20, 2011·0 cites·10 claims
- 1544US7361446B2Positive resist compositionFUJIFILM CORP·Filed 2004·Granted Apr 22, 2008·0 cites·14 claims
- 1641US2005277060A1Positive resist composition and pattern forming method using the sameFUJI PHOTO FILM CO LTD·Filed 2005·Application pending·0 cites
- 1740US5714303AImage forming method using strippable layer and light-sensitive polymerizable layer containing silver halideFUJI PHOTO FILM CO LTD·Filed 1996·Granted Feb 3, 1998·5 cites·6 claims
- 1839US9090722B2Chemical amplification resist composition, and mold preparation method and resist film using the sameFUJIMORI TORU·Filed 2010·Granted Jul 28, 2015·0 cites·19 claims
- 1939US7332258B2Positive resist composition and process for forming pattern using the sameFUJIFILM CORP·Filed 2004·Granted Feb 19, 2008·0 cites·11 claims
- 2037US6746813B2Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Jun 8, 2004·0 cites·10 claims
- 2137US2004053160A1Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Application pending·0 cites
- 2236US2012003585A1Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTSUBAKI HIDEAKI·Filed 2010·Application pending·0 cites
- 2335US5612167AImage forming method using strippable layer and light-sensitive polymerizable layer containing silver halideFUJI PHOTO FILM CO LTD·Filed 1995·Granted Mar 18, 1997·3 cites·5 claims
- 2435US2012094235A1Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTSUCHIHASHI TORU·Filed 2010·Application pending·0 cites
- 2534US7432034B2Negative resist compositionFUJIFILM CORP·Filed 2003·Granted Oct 7, 2008·1 cites·17 claims
- 2630US6887647B2Negative-working resist composition for electron beams or x-raysFUJI PHOTO FILM CO LTD·Filed 2002·Granted May 3, 2005·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →