Inventor · disambiguated record
Eberhard A. Spiller
Also filed as: SPILLER EBERHARD · SPILLER EBERHARD A
10 granted patents·3 pending applications·272 citations·filing 1975–2008
91Inventor score
Top patents by PatentIndex Score
13 records- 0189US6780496B2Optimized capping layers for EUV multilayersEUV LLC·Filed 2002·Granted Aug 24, 2004·43 cites·20 claims
- 0288US4018938AFabrication of high aspect ratio masksIBM·Filed 1975·Granted Apr 19, 1977·46 cites·18 claims
- 0385US6134049AMethod to adjust multilayer film stress induced deformation of opticsUNIV CALIFORNIA·Filed 1998·Granted Oct 17, 2000·71 cites·23 claims
- 0481US3984582AMethod for preparing positive resist imageIBM·Filed 1975·Granted Oct 5, 1976·38 cites·29 claims
- 0579US6849859B2Fabrication of precision optics using an imbedded reference surfaceEUV LLC·Filed 2001·Granted Feb 1, 2005·20 cites·31 claims
- 0679US6634760B2Low-cost method for producing extreme ultraviolet lithography opticsUNIV CALIFORNIA·Filed 2001·Granted Oct 21, 2003·21 cites·15 claims
- 0768US5958143ACleaning process for EUV optical substratesUNIV CALIFORNIA·Filed 1998·Granted Sep 28, 1999·21 cites·24 claims
- 0865US7672430B2Area X-ray or UV camera system for high-intensity beamsL LIVERMORE NAT SECURITY LLC·Filed 2008·Granted Mar 2, 2010·4 cites·27 claims
- 0946US4595261APhase retardation element and prism for use in an optical data storage systemIBM·Filed 1983·Granted Jun 17, 1986·5 cites·3 claims
- 1043US2005118533A1Planarization of substrate pits and scratchesFiled 2004·Application pending·0 cites
- 1139US2003008148A1Optimized capping layers for EUV multilayersFiled 2001·Application pending·0 cites
- 1238US2003164998A1Ion-assisted deposition techniques for the planarization of topological defectsUNIV CALIFORNIA·Filed 2002·Application pending·0 cites
- 1329US4268952AMethod for fabricating self-aligned high resolution non planar devices employing low resolution registrationIBM·Filed 1979·Granted May 26, 1981·3 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →