Inventor · disambiguated record
Gregory R. Mcintyre
Also filed as: MCINTYRE GREGORY R
23 granted patents·1 pending application·298 citations·filing 2005–2014
96Inventor score
Top patents by PatentIndex Score
24 records- 0197US7653892B1System and method for implementing image-based design rulesCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Jan 26, 2010·48 cites·16 claims
- 0297US7418693B1System and method for analysis and transformation of layouts using situationsCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Aug 26, 2008·72 cites·10 claims
- 0396US7818707B1Fast pattern matchingCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Oct 19, 2010·36 cites·25 claims
- 0494US8748063B2Extreme ultraviolet (EUV) multilayer defect compensation and EUV masksGALLAGHER EMILY E·Filed 2012·Granted Jun 10, 2014·12 cites·22 claims
- 0594US7707542B1Creating a situation repositoryCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Apr 27, 2010·24 cites·27 claims
- 0693US7831942B1Design check databaseCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Nov 9, 2010·20 cites·48 claims
- 0791US8765331B2Reducing edge die reflectivity in extreme ultraviolet lithographyGALLAGHER EMILY E·Filed 2012·Granted Jul 1, 2014·9 cites·24 claims
- 0890US8769474B1Fast pattern matchingGENNARI FRANK E·Filed 2010·Granted Jul 1, 2014·8 cites·20 claims
- 0990US8327299B1System and method for implementing image-based design rulesGENNARI FRANK E·Filed 2009·Granted Dec 4, 2012·13 cites·20 claims
- 1088US8368890B2Polarization monitoring reticle design for high numerical aperture lithography systemsIBM·Filed 2010·Granted Feb 5, 2013·5 cites·33 claims
- 1188US8365103B1System and method for implementing image-based design rulesCADENCE DESIGN SYSTEMS INC·Filed 2009·Granted Jan 29, 2013·10 cites·33 claims
- 1288US7752577B1Constraint plus patternCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Jul 6, 2010·11 cites·51 claims
- 1386US8631373B1Yield analysis with situationsGENNARI FRANK E·Filed 2009·Granted Jan 14, 2014·8 cites·19 claims
- 1478US8679708B2Polarization monitoring reticle design for high numerical aperture lithography systemsIBM·Filed 2012·Granted Mar 25, 2014·2 cites·20 claims
- 1578US7661087B1Yield analysis with situationsCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Feb 9, 2010·4 cites·24 claims
- 1677US7224458B2Phase-shifting test mask patterns for characterizing illumination polarization balance in image forming optical systemsUNIV CALIFORNIA·Filed 2006·Granted May 29, 2007·9 cites·9 claims
- 1776US8091047B1System and method for implementing image-based design rulesGENNARI FRANK E·Filed 2009·Granted Jan 3, 2012·3 cites·20 claims
- 1871US7648802B2Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systemsUNIV CALIFORNIA·Filed 2005·Granted Jan 19, 2010·3 cites·5 claims
- 1970US9086639B2Fabrication of on-product aberration monitors with nanomachiningIBM·Filed 2013·Granted Jul 21, 2015·1 cites·20 claims
- 2061US9052617B2Extreme ultraviolet (EUV) multilayer defect compensation and EUV masksIBM·Filed 2014·Granted Jun 9, 2015·0 cites·9 claims
- 2156US8546069B2Method for enhancing lithographic imaging of isolated and semi-isolated featuresHUANG WU-SONG·Filed 2009·Granted Oct 1, 2013·0 cites·15 claims
- 2255US2013330672A1Method for enhancing lithographic imaging of isolated and semi-isolated featuresIBM·Filed 2013·Application pending·0 cites
- 2353US8031330B2Mixed polarization state monitoringIBM·Filed 2008·Granted Oct 4, 2011·0 cites·18 claims
- 2436US9261793B2Image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distributionMCINTYRE GREGORY R·Filed 2012·Granted Feb 16, 2016·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →