Inventor · disambiguated record
Rajiv Krishan Agarwal
Also filed as: AGARWAL RAJIV K · AGARWAL RAJIV KRISHAN
8 granted patents·1 pending application·32 citations·filing 2003–2018
82Inventor score
Top patents by PatentIndex Score
9 records- 0193US9976111B2TiN hard mask and etch residual removalAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·5 cites·30 claims
- 0285US9284198B2Process for making trisilylamineAIR PROD & CHEM·Filed 2014·Granted Mar 15, 2016·5 cites·19 claims
- 0380US8206676B2Method for making a chlorosilaneAGARWAL RAJIV K·Filed 2010·Granted Jun 26, 2012·5 cites·14 claims
- 0465US10073351B2Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivationAIR PROD & CHEM·Filed 2015·Granted Sep 11, 2018·1 cites·16 claims
- 0560US6963006B2Process for the production and purification of bis(tertiary-butylamino)silaneAIR PROD & CHEM·Filed 2003·Granted Nov 8, 2005·16 cites·20 claims
- 0656US9463978B2Process for making trisilylamineAIR PROD & CHEM·Filed 2016·Granted Oct 11, 2016·0 cites·20 claims
- 0753US10711227B2TiN hard mask and etch residue removalVERSUM MAT US LLC·Filed 2018·Granted Jul 14, 2020·0 cites·24 claims
- 0840US2014196664A1System and method for tungsten hexafluoride recovery and reuseAIR PROD & CHEM·Filed 2014·Application pending·0 cites
- 0937US7250072B2Removal of sulfur-containing impurities from volatile metal hydridesAIR PROD & CHEM·Filed 2003·Granted Jul 31, 2007·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →