Inventor · disambiguated record
Zhong-Wei Chen
Also filed as: CHEN ZHONG · CHEN ZHONG-WEI
58 granted patents·7 pending applications·1,035 citations·filing 1995–2025
98Inventor score
Files withASML NETHERLANDS BV36HERMES MICROVISION INC15HONEYWELL INT INC3KLA INSTR CORP3HUAWEI TECH CO LTD2
Top patents by PatentIndex Score
65 records- 0197US11804356B2Apparatus using multiple beams of charged particlesASML NETHERLANDS BV·Filed 2022·Granted Oct 31, 2023·2 cites·20 claims
- 0297US5717204AInspecting optical masks with electron beam microscopyKLA INSTR CORP·Filed 1996·Granted Feb 10, 1998·148 cites·8 claims
- 0396US5665968AInspecting optical masks with electron beam microscopyKLA INSTR CORP·Filed 1996·Granted Sep 9, 1997·120 cites·2 claims
- 0495US7872236B2Charged particle detection devicesHERMES MICROVISION INC·Filed 2007·Granted Jan 18, 2011·23 cites·21 claims
- 0595US7105436B2Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturingHERMES MICROVISION INC·Filed 2004·Granted Sep 12, 2006·84 cites·12 claims
- 0695US6392231B1Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and methodHERMES MICROVISION INC·Filed 2000·Granted May 21, 2002·56 cites·47 claims
- 0795US5578821AElectron beam inspection system and methodKLA INSTR CORP·Filed 1995·Granted Nov 26, 1996·421 cites·51 claims
- 0894US11282675B2Multi-beam inspection apparatus with improved detection performance of signal electronsASML NETHERLANDS BV·Filed 2021·Granted Mar 22, 2022·2 cites·20 claims
- 0994US11222766B2Multi-cell detector for charged particlesASML NETHERLANDS BV·Filed 2018·Granted Jan 11, 2022·4 cites·15 claims
- 1092US12211669B2Multiple charged-particle beam apparatus with low crosstalkASML NETHERLANDS BV·Filed 2020·Granted Jan 28, 2025·3 cites·17 claims
- 1192US7759653B2Electron beam apparatusHERMES MICROVISION INC·Filed 2008·Granted Jul 20, 2010·16 cites·11 claims
- 1291US7928383B2Charged particle system including segmented detection elementsHERMES MICROVISION INC·Filed 2008·Granted Apr 19, 2011·11 cites·20 claims
- 1391US7705301B2Electron beam apparatus to collect side-view and/or plane-view image with in-lens sectional detectorHERMES MICROVISION INC·Filed 2007·Granted Apr 27, 2010·21 cites·15 claims
- 1490US12196692B2Systems and methods for voltage contrast defect detectionASML NETHERLANDS BV·Filed 2020·Granted Jan 14, 2025·2 cites·20 claims
- 1590US7893406B1Electron gun with magnetic immersion double condenser lensesHERMES MICROVISION INC·Filed 2006·Granted Feb 22, 2011·11 cites·16 claims
- 1689US11594396B2Multi-beam inspection apparatus with single-beam modeASML NETHERLANDS BV·Filed 2020·Granted Feb 28, 2023·2 cites·14 claims
- 1789US11289304B2Apparatus using multiple beams of charged particlesASML NETHERLANDS BV·Filed 2018·Granted Mar 29, 2022·3 cites·15 claims
- 1889US10892138B2Multi-beam inspection apparatus with improved detection performance of signal electronsASML NETHERLANDS BV·Filed 2019·Granted Jan 12, 2021·3 cites·15 claims
- 1989US7705298B2System and method to determine focus parameters during an electron beam inspectionHERMES MICROVISION INC TAIWAN·Filed 2007·Granted Apr 27, 2010·20 cites·10 claims
- 2086US12237144B2Apparatus using multiple beams of charged particlesASML NETHERLANDS BV·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 2184US9898934B2Prediction of vehicle maneuversHONEYWELL INT INC·Filed 2016·Granted Feb 20, 2018·6 cites·20 claims
- 2284US9400176B2Dynamic focus adjustment with optical height detection apparatus in electron beam systemHERMES MICROVISION INC·Filed 2014·Granted Jul 26, 2016·4 cites·13 claims
- 2383US12463010B2Multiple charged-particle beam apparatus and methodsASML NETHERLANDS BV·Filed 2023·Granted Nov 4, 2025·0 cites·21 claims
- 2483US11513087B2Systems and methods for voltage contrast defect detectionASML NETHERLANDS BV·Filed 2020·Granted Nov 29, 2022·1 cites·15 claims
- 2583US6960766B2Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and methodHERMES MICROVISION INC·Filed 2003·Granted Nov 1, 2005·18 cites·26 claims
- 2683US6605805B2Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and methodHERMES MICROVISION INC·Filed 2002·Granted Aug 12, 2003·16 cites·3 claims
- 2783US2025208074A1Systems and methods for voltage contrast defect detectionASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2881US11961697B2Apparatus using charged particle beamsASML NETHERLANDS BV·Filed 2023·Granted Apr 16, 2024·0 cites·20 claims
- 2981US11527405B2In-die metrology methods and systems for process controlASML NETHERLANDS BV·Filed 2019·Granted Dec 13, 2022·2 cites·15 claims
- 3081US8314401B2Electron gun with magnetic immersion double condenser lensesZHANG XU·Filed 2010·Granted Nov 20, 2012·4 cites·22 claims
- 3180US7335879B2System and method for sample charge controlHERMES MICROVISION INC·Filed 2005·Granted Feb 26, 2008·5 cites·30 claims
- 3279US11721521B2Multi-beam inspection apparatus with improved detection performance of signal electronsASML NETHERLANDS BV·Filed 2022·Granted Aug 8, 2023·0 cites·24 claims
- 3379US9773421B2Aircraft maneuver data management systemHONEYWELL INT INC·Filed 2015·Granted Sep 26, 2017·4 cites·20 claims
- 3478US6710342B1Method and apparatus for scanning semiconductor wafers using a scanning electron microscopeHERMES MICROVISION INC·Filed 2000·Granted Mar 23, 2004·11 cites·23 claims
- 3578US2025157783A1Apparatus using multiple beams of charged particlesASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 3676US11676793B2Apparatus of plural charged particle beamsASML NETHERLANDS BV·Filed 2019·Granted Jun 13, 2023·1 cites·19 claims
- 3776US10691854B1Graph-based timing analysis timing calibrationAVATAR INTEGRATED SYSTEMS INC·Filed 2018·Granted Jun 23, 2020·2 cites·20 claims
- 3876US2024044820A1Methods of inspecting samples with a beam of charged particlesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3975US11688579B2Electron emitter and method of fabricating sameASML NETHERLANDS BV·Filed 2021·Granted Jun 27, 2023·0 cites·15 claims
- 4074US12243709B2Apparatus using multiple charged particle beamsASML NETHERLANDS BV·Filed 2021·Granted Mar 4, 2025·0 cites·10 claims
- 4173US12040187B2In-die metrology methods and systems for process controlASML NETHERLANDS BV·Filed 2022·Granted Jul 16, 2024·0 cites·15 claims
- 4273US8218284B2Apparatus for increasing electric conductivity to a semiconductor wafer substrate when exposure to electron beamCHEN ZHONG-WEI·Filed 2008·Granted Jul 10, 2012·4 cites·15 claims
- 4373US7474001B2Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturingHERMES MICROVISION INC·Filed 2006·Granted Jan 6, 2009·4 cites·5 claims
- 4472US11538655B2Multi-beam inspection apparatusASML NETHERLANDS BV·Filed 2020·Granted Dec 27, 2022·0 cites·18 claims
- 4572US2025226175A1Dynamic determination of a sample inspection recipe of charged particle beam inspectionASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 4667USRE49784EApparatus of plural charged-particle beamsASML NETHERLANDS BV·Filed 2020·Granted Jan 2, 2024·0 cites·100 claims
- 4767US11854765B2Multiple charged-particle beam apparatus and methodsASML NETHERLANDS BV·Filed 2020·Granted Dec 26, 2023·0 cites·17 claims
- 4867US11815473B2Methods of inspecting samples with multiple beams of charged particlesASML NETHERLANDS BV·Filed 2020·Granted Nov 14, 2023·0 cites·20 claims
- 4967US8022609B2Thermal field emission cathodeHERMES MICROVISION INC·Filed 2008·Granted Sep 20, 2011·1 cites·21 claims
- 5065US10879032B2Multi-beam inspection apparatusASML NETHERLANDS BV·Filed 2019·Granted Dec 29, 2020·0 cites·15 claims
Showing the top 50 of 65 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →