Inventor · disambiguated record
Yun-Sik Yang
Also filed as: YANG YUN-SIK
14 granted patents·5 pending applications·256 citations·filing 1998–2016
93Inventor score
Top patents by PatentIndex Score
19 records- 0193US7578944B2Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 25, 2009·23 cites·11 claims
- 0286US7193369B2Method for generating gas plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Mar 20, 2007·30 cites·25 claims
- 0385US6537143B1Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Mar 25, 2003·32 cites·9 claims
- 0483US6623597B1Focus ring and apparatus for processing a semiconductor wafer comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Sep 23, 2003·53 cites·12 claims
- 0580US9773645B2Remote plasma generator using ceramicSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Sep 26, 2017·4 cites·16 claims
- 0675US6684652B2Method of and an apparatus for regulating the temperature of an electrostatic chuckSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Feb 3, 2004·22 cites·5 claims
- 0774US6039770ASemiconductor device manufacturing system having means for reducing a pressure difference between loadlock and processing chambersSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Mar 21, 2000·47 cites·17 claims
- 0873US7764483B2Semiconductor etching apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jul 27, 2010·4 cites·3 claims
- 0973US6860801B2Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 1, 2005·14 cites·4 claims
- 1072US6816029B2RF matching unitSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Nov 9, 2004·9 cites·20 claims
- 1170US6443826B1Polishing head of a chemical mechanical polishing apparatus and, retainer ring of the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Sep 3, 2002·15 cites·14 claims
- 1251US8083892B2Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the sameMIN YOUNG-MIN·Filed 2009·Granted Dec 27, 2011·0 cites·13 claims
- 1351US2008095953A1Apparatus for depositing thin film and method of depositing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1446US2008194113A1Methods and apparatus for semiconductor etching including an electro static chuckSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1543US6705020B2Method of and apparatus for use in orienting an object at a reference angleSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 16, 2004·3 cites·20 claims
- 1643US2005092245A1Plasma chemical vapor deposition apparatus having an improved nozzle configurationFiled 2004·Application pending·0 cites
- 1742US2007297794A1Photolithography system and methodSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1840US2005220576A1Substrate manufacturing apparatus and substrate transfer module used thereinSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 1936US6824617B2Input/output valve switching apparatus of semiconductor manufacturing systemSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Nov 30, 2004·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →