Inventor · disambiguated record
Gyeong-Su Keum
Also filed as: KEUM GYEONG-SU
9 granted patents·6 pending applications·59 citations·filing 1999–2008
85Inventor score
Top patents by PatentIndex Score
15 records- 0176US6858854B2Method and apparatus for measuring inclination angle of ion beamSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 22, 2005·22 cites·36 claims
- 0265US6720533B2Heater assembly for heating a waferSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Apr 13, 2004·11 cites·12 claims
- 0360US7652264B2Filament member, ion source, and ion implantation apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jan 26, 2010·1 cites·17 claims
- 0460US7170070B2Ion implanters having an arc chamber that affects ion current densitySAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jan 30, 2007·1 cites·21 claims
- 0549US6449585B1Wafer sidewall inspection system and methodSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Sep 10, 2002·19 cites·36 claims
- 0643US6705020B2Method of and apparatus for use in orienting an object at a reference angleSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 16, 2004·3 cites·20 claims
- 0742US7112810B2Ion implanting apparatus and ion implanting method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Sep 26, 2006·1 cites·23 claims
- 0842US2008289576A1Plasma based ion implantation systemSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 0941US2007087584A1Plasma doping method and plasma doping apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1041US2007114436A1Filament member, ion source, and ion implantation apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1140US6590378B2Real time parameter monitoring apparatus for high voltage chamber in semiconductor wafer processing systemSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jul 8, 2003·1 cites·15 claims
- 1240US2007077366A1Plasma doping method and plasma doping apparatus for performing the sameKEUM GYEONG-SU·Filed 2006·Application pending·0 cites
- 1336US6903336B2Polarity exchanger and ion implanter having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 7, 2005·0 cites·19 claims
- 1436US2003107866A1Electrostatic chuck of an ion implanterFiled 2002·Application pending·0 cites
- 1535US2005022742A1Chemical vapor deposition processing equipment for use in fabricating a semiconductor deviceFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →