Inventor · disambiguated record
Sosuke Osawa
Also filed as: OSAWA SOSUKE
7 granted patents·3 pending applications·0 citations·filing 2016–2025
68Inventor score
Files withJSR CORP10
Top patents by PatentIndex Score
10 records- 0174US2025321484A1Method for forming resist pattern and radiation-sensitive resin compositionJSR CORP·Filed 2025·Application pending·0 cites
- 0264US11603459B2Resin composition and method of forming resist patternJSR CORP·Filed 2021·Granted Mar 14, 2023·0 cites·20 claims
- 0363US12372869B2Method for forming resist pattern and radiation-sensitive resin compositionJSR CORP·Filed 2021·Granted Jul 29, 2025·0 cites·17 claims
- 0457US2023203229A1Composition, underlayer film, and directed self-assembly lithography processJSR CORP·Filed 2023·Application pending·0 cites
- 0557US2023259032A1Composition, underlayer film, and directed self-assembly lithography processJSR CORP·Filed 2023·Application pending·0 cites
- 0655US11687003B2Negative resist pattern-forming method, and composition for upper layer film formationJSR CORP·Filed 2018·Granted Jun 27, 2023·0 cites·20 claims
- 0753US11130856B2Resin composition and method of forming resist patternJSR CORP·Filed 2019·Granted Sep 28, 2021·0 cites·22 claims
- 0851US11745216B2Method for producing filmJSR CORP·Filed 2022·Granted Sep 5, 2023·0 cites·20 claims
- 0949US10073344B2Negative resist pattern-forming method, and composition for upper layer film formationJSR CORP·Filed 2016·Granted Sep 11, 2018·0 cites·16 claims
- 1032US11340528B2Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layerJSR CORP·Filed 2019·Granted May 24, 2022·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →