Inventor · disambiguated record
Shinichiro Shimomura
Also filed as: SHIMOMURA SHINICHIRO
9 granted patents·1 pending application·70 citations·filing 1999–2022
84Inventor score
Top patents by PatentIndex Score
10 records- 0187US6241827B1Method for cleaning a workpieceTOKYO ELECTRON LTD·Filed 1999·Granted Jun 5, 2001·41 cites·12 claims
- 0285US12456632B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 28, 2025·1 cites·15 claims
- 0381US6357458B2Cleaning apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2001·Granted Mar 19, 2002·15 cites·10 claims
- 0477US9278768B2Process liquid changing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Mar 8, 2016·4 cites·4 claims
- 0576US9362106B2Substrate processing method, substrate processing apparatus, and storage mediumSONY CORP·Filed 2013·Granted Jun 7, 2016·4 cites·8 claims
- 0676US9027573B2Substrate processing apparatus for maintaining a more uniform temperature during substrate processingHYAKUTAKE HIRONOBU·Filed 2011·Granted May 12, 2015·5 cites·12 claims
- 0772US11718740B2Method for producing thermoplastic elastomer compositionSUMITOMO CHEMICAL CO·Filed 2022·Granted Aug 8, 2023·0 cites·19 claims
- 0852US11183396B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Nov 23, 2021·0 cites·3 claims
- 0952US2023073624A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1030US9922849B2Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereofTOKYO ELECTRON LTD·Filed 2015·Granted Mar 20, 2018·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →