Inventor · disambiguated record
Haruo Iwatsu
Also filed as: IWATSU HARUO
8 granted patents·8 pending applications·243 citations·filing 1990–2014
85Inventor score
Top patents by PatentIndex Score
16 records- 0192US5127362ALiquid coating deviceTOKYO ELECTRON LTD·Filed 1990·Granted Jul 7, 1992·145 cites·8 claims
- 0283US5312487ACoating apparatusTOKYO ELECTRON LTD·Filed 1992·Granted May 17, 1994·85 cites·22 claims
- 0381US10294575B2Electric field treatment method and electric field treatment deviceTOKYO ELECTRON LTD·Filed 2014·Granted May 21, 2019·2 cites·8 claims
- 0469US9087771B2Method for manufacturing semiconductor device, semiconductor device and jig for forming wiringTOKYO ELECTRON LTD·Filed 2014·Granted Jul 21, 2015·2 cites·11 claims
- 0559US10036095B2Electrolytic treatment method and electrolytic treatment apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 31, 2018·0 cites·26 claims
- 0651US8664106B2Method of manufacturing semiconductor deviceIWATSU HARUO·Filed 2010·Granted Mar 4, 2014·1 cites·8 claims
- 0745US2015108001A1Liquid processing jig and liquid processing methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 0844US10428438B2Substrate processing method and templateTOKYO ELECTRON LTD·Filed 2014·Granted Oct 1, 2019·0 cites·32 claims
- 0942US2015303105A1Method and apparatus for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1041US2014043051A1Inspection apparatus, inspection system and inspection methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1141US2014311530A1Substrate processing method and templateTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 1240US2013078747A1Substrate etching method and substrate etching apparatusTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 1340US2013224951A1Template and substrate processing methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1440US2013098769A1Method for manufacturing semiconductor device, and apparatus for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 1538US6268900B1Accommodating apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 1999·Granted Jul 31, 2001·8 cites·15 claims
- 1628US2012169365A1Substrate inspecting apparatus and aligning method in substrate inspecting apparatusIWATSU HARUO·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →