Inventor · disambiguated record
David E. Seeger
Also filed as: SEEGER DAVID · SEEGER DAVID E · SEEGER DAVID EARLE
31 granted patents·1 pending application·1,171 citations·filing 1986–2008
98Inventor score
Top patents by PatentIndex Score
32 records- 0197US5470661ADiamond-like carbon films from a hydrocarbon helium plasmaIBM·Filed 1993·Granted Nov 28, 1995·362 cites·7 claims
- 0297US5370825AWater-soluble electrically conducting polymers, their synthesis and useIBM·Filed 1993·Granted Dec 6, 1994·101 cites·59 claims
- 0395US7230334B2Semiconductor integrated circuit chip packages having integrated microchannel cooling modulesIBM·Filed 2004·Granted Jun 12, 2007·66 cites·25 claims
- 0495US6639488B2MEMS RF switch with low actuation voltageIBM·Filed 2001·Granted Oct 28, 2003·75 cites·24 claims
- 0593US6685853B1Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewithIBM·Filed 2000·Granted Feb 3, 2004·79 cites·9 claims
- 0692US6344305B1Radiation sensitive silicon-containing resistsIBM·Filed 2000·Granted Feb 5, 2002·42 cites·11 claims
- 0792US4752668ASystem for laser removal of excess material from a semiconductor waferROSENFIELD MICHAEL G·Filed 1986·Granted Jun 21, 1988·93 cites·19 claims
- 0890US7948077B2Integrated circuit chip module with microchannel cooling device having specific fluid channel arrangementIBM·Filed 2008·Granted May 24, 2011·13 cites·19 claims
- 0988US7888786B2Electronic module comprising memory and integrated circuit processor chips formed on a microchannel cooling deviceIBM·Filed 2007·Granted Feb 15, 2011·11 cites·19 claims
- 1088US5569501ADiamond-like carbon films from a hydrocarbon helium plasmaIBM·Filed 1995·Granted Oct 29, 1996·82 cites·28 claims
- 1184US6187505B1Radiation sensitive silicon-containing resistsIBM·Filed 1999·Granted Feb 13, 2001·46 cites·17 claims
- 1279US6010645AWater-soluble electrically conducting polymers, their synthesis and useIBM·Filed 1994·Granted Jan 4, 2000·24 cites·95 claims
- 1377US6876282B2Micro-electro-mechanical RF switchIBM·Filed 2002·Granted Apr 5, 2005·18 cites·9 claims
- 1476US7212091B2Micro-electro-mechanical RF switchIBM·Filed 2005·Granted May 1, 2007·7 cites·13 claims
- 1572US6280901B1High sensitivity, photo-active polymer and developers for high resolution resist applicationsIBM·Filed 2000·Granted Aug 28, 2001·8 cites·10 claims
- 1665US6132644AEnergy sensitive electrically conductive admixturesIBM·Filed 1998·Granted Oct 17, 2000·28 cites·7 claims
- 1764US6830708B2Water-soluble electrically conducting polymers, their synthesis and useIBM·Filed 2001·Granted Dec 14, 2004·6 cites·144 claims
- 1863US5264328AResist development endpoint detection for X-ray lithographyIBM·Filed 1992·Granted Nov 23, 1993·17 cites·18 claims
- 1960US5593812APhotoresist having increased sensitivity and use thereofIBM·Filed 1995·Granted Jan 14, 1997·18 cites·18 claims
- 2057US6103145ACrosslinked water-soluble electrically conducting polymersIBM·Filed 1995·Granted Aug 15, 2000·12 cites·19 claims
- 2157US5759637AWater-Soluable electrically conducting polymers, their synthesis and useIBM·Filed 1995·Granted Jun 2, 1998·12 cites·25 claims
- 2250US5753412APhotoresist having increased sensitivity and use thereofIBM·Filed 1996·Granted May 19, 1998·11 cites·31 claims
- 2347US5770345APhotoresist having increased sensitivity and use thereofIBM·Filed 1996·Granted Jun 23, 1998·9 cites·15 claims
- 2442US5955242AHigh sensitivity, photo-active polymer and developers for high resolution resist applicationsIBM·Filed 1996·Granted Sep 21, 1999·7 cites·17 claims
- 2539US7166241B1Water-soluble electrically conducting polymers, their synthesis and useIBM·Filed 1995·Granted Jan 23, 2007·5 cites·82 claims
- 2639US5908732APolymer compositions for high resolution resist applicationsIBM·Filed 1996·Granted Jun 1, 1999·5 cites·40 claims
- 2737US5178975AHigh resolution X-ray mask having high aspect ratio absorber patternsIBM·Filed 1991·Granted Jan 12, 1993·7 cites·6 claims
- 2837US2004077140A1Apparatus and method for forming uniformly thick anodized films on large substratesFiled 2002·Application pending·0 cites
- 2936US5567569AProcess for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ringIBM·Filed 1996·Granted Oct 22, 1996·4 cites·19 claims
- 3032US6100011AHigh sensitivity, photo-active polymer and developers for high resolution resist applicationsIBM·Filed 1998·Granted Aug 8, 2000·1 cites·23 claims
- 3132US5552256APositive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ringIBM·Filed 1994·Granted Sep 3, 1996·2 cites·8 claims
- 3230US5644038AQuinone diazo compound containing non-metallic atomIBM·Filed 1996·Granted Jul 1, 1997·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →