Inventor · disambiguated record
Junichi Horikawa
Also filed as: HORIKAWA JUNICHI
24 granted patents·2 pending applications·566 citations·filing 1986–2019
96Inventor score
Top patents by PatentIndex Score
26 records- 0197US8623528B2Method of manufacturing perpendicular magnetic recording medium and perpendicular magnetic recording mediumUMEZAWA TEIICHIRO·Filed 2009·Granted Jan 7, 2014·73 cites·2 claims
- 0296US8057926B2Perpendicular magnetic recording mediumAYAMA KENJI·Filed 2008·Granted Nov 15, 2011·70 cites·5 claims
- 0396US7993765B2Perpendicular magnetic recording mediumWD MEDIA SINGAPORE PTE LTD·Filed 2004·Granted Aug 9, 2011·74 cites·6 claims
- 0493US8559131B2Perpendicular magnetic recording media and magnetic disc apparatusMASUDA DAISUKE·Filed 2011·Granted Oct 15, 2013·69 cites·8 claims
- 0591US10001699B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2016·Granted Jun 19, 2018·6 cites·14 claims
- 0690US6670055B2Magnetic recording medium and manufacturing method thereforHOYA CORP·Filed 2001·Granted Dec 30, 2003·87 cites·9 claims
- 0790US6287429B1Magnetic recording medium having an improved magnetic characteristicHOYA CORP·Filed 1999·Granted Sep 11, 2001·87 cites·4 claims
- 0887US4772904ADiaphragm drive deviceCANON KK·Filed 1986·Granted Sep 20, 1988·26 cites·5 claims
- 0982US5640089AMethod and apparatus for surface roughness detection - using a magnetoresistive elementHOYA CORP·Filed 1995·Granted Jun 17, 1997·38 cites·14 claims
- 1081US9897909B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2016·Granted Feb 20, 2018·2 cites·8 claims
- 1175US9348217B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2013·Granted May 24, 2016·2 cites·15 claims
- 1275US7972662B2Substrate for information recording medium, information recording medium and process for producing information recording mediumHOYA CORP·Filed 2007·Granted Jul 5, 2011·2 cites·4 claims
- 1374US9494851B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2013·Granted Nov 15, 2016·2 cites·30 claims
- 1474US7208238B2Substrate for information recording medium, information recording medium and process for producing information recording mediumHOYA CORP·Filed 2003·Granted Apr 24, 2007·10 cites·13 claims
- 1565US10620527B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2019·Granted Apr 14, 2020·0 cites·20 claims
- 1660US10429728B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2017·Granted Oct 1, 2019·0 cites·21 claims
- 1760US10295900B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2018·Granted May 21, 2019·0 cites·26 claims
- 1860US9581895B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor deviceHOYA CORP·Filed 2013·Granted Feb 28, 2017·0 cites·26 claims
- 1960US5954927AMethod of manufacturing magnetic recording mediumHOYA CORP·Filed 1997·Granted Sep 21, 1999·12 cites·1 claims
- 2057US10025176B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jul 17, 2018·0 cites·17 claims
- 2153US11237472B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2018·Granted Feb 1, 2022·0 cites·20 claims
- 2246US5746893AMethod of manufacturing magnetic recording mediumHOYA CORP·Filed 1995·Granted May 5, 1998·6 cites·19 claims
- 2345US9507254B2Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2013·Granted Nov 29, 2016·0 cites·17 claims
- 2444US7357998B2Disk substrate for a perpendicular magnetic recording medium, perpendicular magnetic recording disk and manufacturing methods thereofHOYA CORP·Filed 2004·Granted Apr 15, 2008·0 cites·6 claims
- 2537US2004265617A1Disk substrate for a perpendicular magnetic recording medium and perpendicular magnetic recording diskHOYA CORP·Filed 2004·Application pending·0 cites
- 2636US2010215992A1Single-sided perpendicular magnetic recording mediumHOYA CORP·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →