Inventor · disambiguated record
Hengpeng Wu
Also filed as: WU HENGPENG
32 granted patents·7 pending applications·332 citations·filing 2001–2022
97Inventor score
Files withAZ ELECTRONIC MATERIALS USA11MERCK PATENT GMBH7WU HENGPENG7AZ ELECTRONIC MAT (LUXEMBOURG) S A R L2RIDGEFIELD ACQUISITION2
Top patents by PatentIndex Score
39 records- 0196US9574104B1Compositions and processes for self-assembly of block copolymersAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Granted Feb 21, 2017·19 cites·16 claims
- 0296US8691925B2Compositions of neutral layer for directed self assembly block copolymers and processes thereofWU HENGPENG·Filed 2011·Granted Apr 8, 2014·30 cites·20 claims
- 0396US8329387B2Antireflective coating compositionsYAO HUIRONG·Filed 2008·Granted Dec 11, 2012·38 cites·8 claims
- 0496US7824837B2Positive-working photoimageable bottom antireflective coatingAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Nov 2, 2010·54 cites·22 claims
- 0594US8835581B2Neutral layer polymer composition for directed self assembly and processes thereofWU HENGPENG·Filed 2012·Granted Sep 16, 2014·16 cites·15 claims
- 0694US8686109B2Methods and materials for removing metals in block copolymersYIN JIAN·Filed 2012·Granted Apr 1, 2014·11 cites·18 claims
- 0794US7691556B2Antireflective compositions for photoresistsAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Apr 6, 2010·29 cites·27 claims
- 0892US7638262B2Antireflective composition for photoresistsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Dec 29, 2009·19 cites·20 claims
- 0989US9052598B2Compositions of neutral layer for directed self assembly block copolymers and processes thereofWU HENGPENG·Filed 2014·Granted Jun 9, 2015·6 cites·9 claims
- 1088US8039202B2Positive-working photoimageable bottom antireflective coatingAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Oct 18, 2011·11 cites·19 claims
- 1187US9093263B2Underlayer composition for promoting self assembly and method of making and usingWU HENGPENG·Filed 2013·Granted Jul 28, 2015·8 cites·20 claims
- 1281US7081511B2Process for making polyestersAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted Jul 25, 2006·21 cites·25 claims
- 1380US9040659B2Methods and materials for removing metals in block copolymersYIN JIAN·Filed 2014·Granted May 26, 2015·4 cites·14 claims
- 1480US8026040B2Silicone coating compositionAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Sep 27, 2011·5 cites·13 claims
- 1579US8852848B2Composition for coating over a photoresist patternWU HENGPENG·Filed 2010·Granted Oct 7, 2014·3 cites·19 claims
- 1675US7030201B2Bottom antireflective coatingsAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Apr 18, 2006·7 cites·22 claims
- 1773US6800415B2Negative-acting aqueous photoresist compositionCLARIANT FINANCE BVI LTD·Filed 2001·Granted Oct 5, 2004·12 cites·12 claims
- 1872US9291909B2Composition comprising a polymeric thermal acid generator and processes thereofWU HENGPENG·Filed 2013·Granted Mar 22, 2016·3 cites·17 claims
- 1972US8221965B2Antireflective coating compositionsYAO HUIRONG·Filed 2008·Granted Jul 17, 2012·6 cites·14 claims
- 2070US9505945B2Silicon containing block copolymers for direct self-assembly applicationAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 29, 2016·1 cites·21 claims
- 2164US7264913B2Antireflective compositions for photoresistsAZ ELECTRONIC MATERIALS USA·Filed 2002·Granted Sep 4, 2007·21 cites·31 claims
- 2262US11366392B2Photoresist remover compositionsMERCK PATENT GMBH·Filed 2020·Granted Jun 21, 2022·0 cites·24 claims
- 2361US11168288B2Photoresist remover compositionsMERCK PATENT GMBH·Filed 2018·Granted Nov 9, 2021·0 cites·26 claims
- 2461US7008476B2Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereofAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Mar 7, 2006·7 cites·12 claims
- 2560US2025244669A1Compositions and methods of improving metal structure fabrication by wet chemical etchMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 2659US11994803B2Photoresist remover compositionsMERCK PATENT GMBH·Filed 2020·Granted May 28, 2024·0 cites·8 claims
- 2756US2024004303A1Photoresist remover compositionsMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 2852US11518730B2Polymer compositions for self-assembly applicationsRIDGEFIELD ACQUISITION·Filed 2017·Granted Dec 6, 2022·0 cites·29 claims
- 2952US11365379B2Photoresist remover compositionsMERCK PATENT GMBH·Filed 2019·Granted Jun 21, 2022·0 cites·26 claims
- 3051US7824844B2Solvent mixtures for antireflective coating compositions for photoresistsAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Nov 2, 2010·0 cites·17 claims
- 3151US2024045333A1Positive-working photoresist composition with improved pattern profile and depth of focus (dof)MERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 3249US2008286689A1Antireflective Coating CompositionsZHUANG HONG·Filed 2007·Application pending·0 cites
- 3349US2009035704A1Underlayer Coating Composition Based on a Crosslinkable PolymerZHUANG HONG·Filed 2007·Application pending·0 cites
- 3441US11067893B2Compositions and processes for self-assembly of block copolymersRIDGEFIELD ACQUISITION·Filed 2017·Granted Jul 20, 2021·0 cites·23 claims
- 3541US7666575B2Antireflective coating compositionsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Feb 23, 2010·1 cites·10 claims
- 3639US2005214674A1Positive-working photoimageable bottom antireflective coatingSUI YU·Filed 2004·Application pending·0 cites
- 3738US2006057501A1Antireflective compositions for photoresistsWU HENGPENG·Filed 2004·Application pending·0 cites
- 3836US10155879B2Compositions and use thereof for modification of substrate surfacesAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2015·Granted Dec 18, 2018·0 cites·17 claims
- 3932US10457088B2Template for self assembly and method of making a self assembled patternKIM JIHOON·Filed 2013·Granted Oct 29, 2019·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →