Inventor · disambiguated record
Emiel Jozef Melanie Eussen
Also filed as: EUSSEN EMIEL JOZEF · EUSSEN EMIEL JOZEF MELANIE
33 granted patents·396 citations·filing 2003–2016
96Inventor score
Files withASML NETHERLANDS BV19VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS4STEIJAERT PETER PAUL3KOENEN WILLEM HERMAN GERTRUDA ANNA2BUTLER HANS1
Top patents by PatentIndex Score
33 records- 0198US7602489B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Oct 13, 2009·117 cites·18 claims
- 0298US7348574B2Position measurement system and lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Mar 25, 2008·138 cites·22 claims
- 0396US7619207B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Nov 17, 2009·88 cites·19 claims
- 0490US8570492B2Lithographic apparatusVAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS·Filed 2012·Granted Oct 29, 2013·6 cites·20 claims
- 0589US9696638B2Lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Jul 4, 2017·3 cites·18 claims
- 0679US7599043B2Position measurement system and lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Oct 6, 2009·4 cites·20 claims
- 0776US8174671B2Lithographic projection apparatus and method for controlling a support structureLOOPSTRA ERIK ROELOF·Filed 2008·Granted May 8, 2012·4 cites·38 claims
- 0875US7557903B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jul 7, 2009·4 cites·8 claims
- 0974US8730485B2Lithographic apparatus and device manufacturing methodVAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS·Filed 2010·Granted May 20, 2014·3 cites·14 claims
- 1072US7999912B2Lithographic apparatus and sensor calibration methodASML NETHERLANDS BV·Filed 2007·Granted Aug 16, 2011·7 cites·25 claims
- 1170US8451454B2Stage system, lithographic apparatus including such stage system, and correction methodKOENEN WILLEM HERMAN GERTRUDA ANNA·Filed 2008·Granted May 28, 2013·3 cites·16 claims
- 1269US8687166B2Lithographic apparatus having an encoder position sensor systemSTEIJAERT PETER PAUL·Filed 2007·Granted Apr 1, 2014·3 cites·20 claims
- 1367US8922756B2Position measurement system, lithographic apparatus and device manufacturing methodKOENEN WILLEM HERMAN GERTRUDA ANNA·Filed 2012·Granted Dec 30, 2014·2 cites·20 claims
- 1465US7283249B2Lithographic apparatus and a method of calibrating such an apparatusASML NETHERLANDS BV·Filed 2005·Granted Oct 16, 2007·2 cites·18 claims
- 1560US9229340B2Lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Jan 5, 2016·0 cites·20 claims
- 1660US8248583B2Lithographic apparatus and calibration methodVAN DEN BRINK MARINUS AART·Filed 2009·Granted Aug 21, 2012·1 cites·18 claims
- 1759US8279407B2Stage system and lithographic apparatus comprising such stage systemKAMIDI RAMIDIN IZAIR·Filed 2009·Granted Oct 2, 2012·1 cites·20 claims
- 1856US8614783B2Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement systemEUSSEN EMIEL JOZEF MELANIE·Filed 2009·Granted Dec 24, 2013·2 cites·34 claims
- 1956US7310130B2Lithographic apparatus and position measuring methodASML NETHERLANDS BV·Filed 2004·Granted Dec 18, 2007·4 cites·25 claims
- 2054US9915880B2Stage apparatus, lithographic apparatus and method of positioning an object tableASML NETHERLANDS BV·Filed 2016·Granted Mar 13, 2018·0 cites·21 claims
- 2152US8836913B2Lithographic apparatus having an encoder type position sensor systemSTEIJAERT PETER PAUL·Filed 2011·Granted Sep 16, 2014·0 cites·15 claims
- 2251US9316928B2Stage apparatus, lithographic apparatus and method of positioning an object tableVAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS·Filed 2011·Granted Apr 19, 2016·0 cites·21 claims
- 2351US8760615B2Lithographic apparatus having encoder type position sensor systemSTEIJAERT PETER PAUL·Filed 2008·Granted Jun 24, 2014·0 cites·20 claims
- 2451US7443511B2Integrated plane mirror and differential plane mirror interferometer systemASML NETHERLANDS BV·Filed 2003·Granted Oct 28, 2008·2 cites·24 claims
- 2550US7136148B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Nov 14, 2006·2 cites·17 claims
- 2646US10331045B2Position measurement system and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jun 25, 2019·0 cites·20 claims
- 2744US7505113B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Mar 17, 2009·0 cites·9 claims
- 2843US8400617B2Lithographic apparatus having a substrate support with open cell plastic foam partsVAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS·Filed 2010·Granted Mar 19, 2013·0 cites·17 claims
- 2943US7242454B1Lithographic apparatus, and apparatus and method for measuring an object position in a mediumASML NETHERLANDS BV·Filed 2005·Granted Jul 10, 2007·0 cites·9 claims
- 3042US8781775B2Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatusBUTLER HANS·Filed 2011·Granted Jul 15, 2014·0 cites·16 claims
- 3142US7978339B2Lithographic apparatus temperature compensationASML NETHERLANDS BV·Filed 2005·Granted Jul 12, 2011·0 cites·5 claims
- 3241US7474409B2Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereofASML NETHERLANDS BV·Filed 2004·Granted Jan 6, 2009·0 cites·39 claims
- 3334US7177059B2Device and method for manipulation and routing of a metrology beamASML NETHERLANDS BV·Filed 2004·Granted Feb 13, 2007·0 cites·15 claims
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