Inventor · disambiguated record
Tomohiro Okumura
Also filed as: OKUMURA TOMOHIRO
111 granted patents·40 pending applications·1,845 citations·filing 1992–2023
99Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD48PANASONIC CORP43OKUMURA TOMOHIRO22PANASONIC IP MAN CO LTD12NAKAYAMA ICHIRO3
Top patents by PatentIndex Score
151 records- 0199US6093457AMethod for plasma processingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Jul 25, 2000·294 cites·20 claims
- 0298US6355573B1Plasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Mar 12, 2002·207 cites·25 claims
- 0398US6030667AApparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasmaMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Feb 29, 2000·194 cites·6 claims
- 0496US7513214B2Plasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Apr 7, 2009·139 cites·15 claims
- 0595US7601619B2Method and apparatus for plasma processingPANASONIC CORP·Filed 2006·Granted Oct 13, 2009·32 cites·23 claims
- 0694US7358511B2Plasma doping method and plasma doping apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2007·Granted Apr 15, 2008·22 cites·19 claims
- 0794US7348264B2Plasma doping methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2007·Granted Mar 25, 2008·20 cites·12 claims
- 0894US6346915B1Plasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Feb 12, 2002·70 cites·21 claims
- 0993US7407874B2Plasma doping methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Granted Aug 5, 2008·18 cites·16 claims
- 1091US5888413APlasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Mar 30, 1999·125 cites·16 claims
- 1191US5372648APlasma CVD systemMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Dec 13, 1994·97 cites·9 claims
- 1290US9583313B2Plasma processing apparatus and plasma processing methodPANASONIC CORP·Filed 2014·Granted Feb 28, 2017·10 cites·5 claims
- 1390US5558722APlasma processing apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Sep 24, 1996·80 cites·8 claims
- 1489US7456085B2Method for introducing impuritiesPANASONIC CORP·Filed 2005·Granted Nov 25, 2008·14 cites·10 claims
- 1585US5609690AVacuum plasma processing apparatus and methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Mar 11, 1997·80 cites·19 claims
- 1684US6808759B1Plasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Oct 26, 2004·26 cites·12 claims
- 1781US9502220B2Plasma processing apparatus and plasma processing methodPANASONIC IP MAN CO LTD·Filed 2015·Granted Nov 22, 2016·3 cites·17 claims
- 1881US7666770B2Method of controlling impurity doping and impurity doping apparatusPANASONIC CORP·Filed 2004·Granted Feb 23, 2010·24 cites·25 claims
- 1980US9673062B1Plasma processing methodPANASONIC IP MAN CO LTD·Filed 2017·Granted Jun 6, 2017·2 cites·2 claims
- 2080US8450819B2Plasma doping method and apparatus thereofOKUMURA TOMOHIRO·Filed 2011·Granted May 28, 2013·6 cites·6 claims
- 2180US7232591B2Method of using an adhesive for temperature control during plasma processingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Jun 19, 2007·26 cites·25 claims
- 2279US9741538B2Plasma processing apparatus, plasma processing method, and method for manufacturing electronic devicePANASONIC IP MAN CO LTD·Filed 2016·Granted Aug 22, 2017·3 cites·6 claims
- 2379US7759254B2Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing devicePANASONIC CORP·Filed 2004·Granted Jul 20, 2010·21 cites·24 claims
- 2479US7280202B2Ingredient analysis method and ingredient analysis apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Oct 9, 2007·8 cites·20 claims
- 2579US7192854B2Method of plasma dopingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Mar 20, 2007·22 cites·11 claims
- 2677US7821387B2Display unit and method for displaying imageDENSO CORP·Filed 2008·Granted Oct 26, 2010·4 cites·11 claims
- 2776US9209043B2Semiconductor manufacturing method and semiconductor manufacturing apparatusPANASONIC IP MAN CO LTD·Filed 2015·Granted Dec 8, 2015·2 cites·5 claims
- 2876US8802567B2Plasma processing methodPANASONIC CORP·Filed 2013·Granted Aug 12, 2014·3 cites·3 claims
- 2975US7135089B2Method and apparatus for plasma processingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Nov 14, 2006·2 cites·5 claims
- 3075US6875307B2Method and apparatus for plasma processingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Apr 5, 2005·8 cites·6 claims
- 3175US5922223APlasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Jul 13, 1999·28 cites·31 claims
- 3274US10181406B2Plasma processing apparatus, plasma processing method, and method for manufacturing electronic devicePANASONIC IP MAN CO LTD·Filed 2015·Granted Jan 15, 2019·2 cites·6 claims
- 3374US8324685B2Semiconductor device having a fin-type semiconductor regionOKUMURA TOMOHIRO·Filed 2010·Granted Dec 4, 2012·3 cites·8 claims
- 3474US7858155B2Plasma processing method and plasma processing apparatusPANASONIC CORP·Filed 2005·Granted Dec 28, 2010·4 cites·33 claims
- 3574US7582492B2Method of doping impurities, and electronic element using the samePANASONIC CORP·Filed 2005·Granted Sep 1, 2009·4 cites·10 claims
- 3673US6905625B2Plasma processing method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Jun 14, 2005·9 cites·30 claims
- 3773US5693236AWater-repellent surface structure and its fabrication methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Dec 2, 1997·35 cites·5 claims
- 3872US8004171B2Dielectric layer containing carbon for a plasma display panelPANASONIC CORP·Filed 2008·Granted Aug 23, 2011·3 cites·2 claims
- 3972US6297165B1Etching and cleaning methodsMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1999·Granted Oct 2, 2001·33 cites·9 claims
- 4071US8162710B2Method for producing plasma display panel with a bright display and a low operating voltageOKUMURA TOMOHIRO·Filed 2010·Granted Apr 24, 2012·2 cites·9 claims
- 4170US7863168B2Plasma doping method and plasma doping apparatusPANASONIC CORP·Filed 2006·Granted Jan 4, 2011·2 cites·1 claims
- 4270US7686971B2Plasma processing apparatus and methodPANASONIC CORP·Filed 2005·Granted Mar 30, 2010·2 cites·6 claims
- 4369US8511290B2EGR valve deviceOKUMURA TOMOHIRO·Filed 2009·Granted Aug 20, 2013·5 cites·7 claims
- 4469US8160298B2Display deviceOKUMURA TOMOHIRO·Filed 2008·Granted Apr 17, 2012·8 cites·6 claims
- 4567US7939388B2Plasma doping method and plasma doping apparatusPANASONIC CORP·Filed 2007·Granted May 10, 2011·2 cites·32 claims
- 4667US6864640B2Plasma processing method and apparatus thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Mar 8, 2005·7 cites·40 claims
- 4766US7858479B2Method and apparatus of fabricating semiconductor devicePANASONIC CORP·Filed 2005·Granted Dec 28, 2010·2 cites·6 claims
- 4866US6517670B2Etching and cleaning apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Feb 11, 2003·8 cites·4 claims
- 4965US9691593B2Plasma processing device and plasma processing methodPANASONIC CORP·Filed 2014·Granted Jun 27, 2017·0 cites·8 claims
- 5065US8129202B2Plasma doping method and apparatusOKUMURA TOMOHIRO·Filed 2009·Granted Mar 6, 2012·1 cites·21 claims
Showing the top 50 of 151 patent records by PatentIndex Score.
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