Inventor · disambiguated record
Roger Patrick
Also filed as: PATRICK ROGER
32 granted patents·6 pending applications·1,969 citations·filing 1987–2023
98Inventor score
Top patents by PatentIndex Score
38 records- 0198US6174450B1Methods and apparatus for controlling ion energy and plasma density in a plasma processing systemLAM RES CORP·Filed 1997·Granted Jan 16, 2001·400 cites·54 claims
- 0298US5556549APower control and delivery in plasma processing equipmentLSI LOGIC CORP·Filed 1994·Granted Sep 17, 1996·257 cites·13 claims
- 0398US5474648AUniform and repeatable plasma processingLSI LOGIC CORP·Filed 1994·Granted Dec 12, 1995·237 cites·30 claims
- 0497US8221582B2Clamped monolithic showerhead electrodePATRICK ROGER·Filed 2008·Granted Jul 17, 2012·67 cites·14 claims
- 0597US5401350ACoil configurations for improved uniformity in inductively coupled plasma systemsLSI LOGIC CORP·Filed 1993·Granted Mar 28, 1995·370 cites·8 claims
- 0694US5468296AApparatus for igniting low pressure inductively coupled plasmaLSI LOGIC CORP·Filed 1993·Granted Nov 21, 1995·80 cites·7 claims
- 0792US8414719B2Clamped monolithic showerhead electrodePATRICK ROGER·Filed 2012·Granted Apr 9, 2013·13 cites·6 claims
- 0892US5407524AEnd-point detection in plasma etching by monitoring radio frequency matching networkLSI LOGIC CORP·Filed 1993·Granted Apr 18, 1995·73 cites·13 claims
- 0990US4879257APlanarization processLSI LOGIC CORP·Filed 1987·Granted Nov 7, 1989·92 cites·12 claims
- 1089US8796153B2Clamped monolithic showerhead electrodeLAM RES CORP·Filed 2013·Granted Aug 5, 2014·7 cites·9 claims
- 1187US8470127B2Cam-locked showerhead electrode and assemblyDE LA LLERA ANTHONY·Filed 2011·Granted Jun 25, 2013·11 cites·9 claims
- 1287US8216418B2Electrode assembly and plasma processing chamber utilizing thermally conductive gasket and o-ringsPATRICK ROGER·Filed 2008·Granted Jul 10, 2012·13 cites·14 claims
- 1381US8152954B2Showerhead electrode assemblies and plasma processing chambers incorporating the sameBETTENCOURT GREG·Filed 2007·Granted Apr 10, 2012·7 cites·22 claims
- 1481US5532516ATechniques for via formation and fillingLSI LOGIC CORPORTION·Filed 1995·Granted Jul 2, 1996·70 cites·4 claims
- 1580US8187413B2Electrode assembly and plasma processing chamber utilizing thermally conductive gasketPATRICK ROGER·Filed 2008·Granted May 29, 2012·5 cites·21 claims
- 1679US7190119B2Methods and apparatus for optimizing a substrate in a plasma processing systemLAM RES CORP·Filed 2003·Granted Mar 13, 2007·22 cites·30 claims
- 1779US5639519AMethod for igniting low pressure inductively coupled plasmaLSI LOGIC CORP·Filed 1995·Granted Jun 17, 1997·40 cites·24 claims
- 1878US9927798B2Mobile connectivity and control of semiconductor manufacturing equipmentLAM RES CORP·Filed 2015·Granted Mar 27, 2018·3 cites·18 claims
- 1977US8343305B2Method and apparatus for diagnosing status of parts in real time in plasma processing equipmentLAM RES CORP·Filed 2007·Granted Jan 1, 2013·6 cites·13 claims
- 2075US5471091ATechniques for via formation and fillingLSI LOGIC CORP·Filed 1991·Granted Nov 28, 1995·42 cites·5 claims
- 2173US9279758B2Method and apparatus for diagnosing status of parts in real time in plasma processing equipmentLAM RES CORP·Filed 2012·Granted Mar 8, 2016·1 cites·17 claims
- 2273US8268117B2Showerhead electrodesBETTENCOURT GREG·Filed 2012·Granted Sep 18, 2012·1 cites·17 claims
- 2370US12198896B2Compact high density plasma sourceLAM RES CORP·Filed 2019·Granted Jan 14, 2025·1 cites·11 claims
- 2470US5869877AMethods and apparatus for detecting pattern dependent charging on a workpiece in a plasma processing systemLAM RES CORP·Filed 1997·Granted Feb 9, 1999·42 cites·29 claims
- 2567US9541514B2Method and apparatus for diagnosing status of parts in real time in plasma processing equipmentLAM RES CORP·Filed 2015·Granted Jan 10, 2017·1 cites·13 claims
- 2663US5904571AMethods and apparatus for reducing charging during plasma processingLAM RES CORP·Filed 1996·Granted May 18, 1999·19 cites·22 claims
- 2761US6062163APlasma initiating assemblyLSI LOGIC CORP·Filed 1997·Granted May 16, 2000·12 cites·9 claims
- 2859US5578165ACoil configurations for improved uniformity in inductively coupled plasma systemsLSI LOGIC CORP·Filed 1995·Granted Nov 26, 1996·31 cites·8 claims
- 2956US7228257B1Architecture for general purpose programmable semiconductor processing system and methods thereforLAM RES CORP·Filed 2003·Granted Jun 5, 2007·5 cites·24 claims
- 3054US2025218774A1High energy atomic layer etch of a carbon containing layerLAM RES CORP·Filed 2023·Application pending·0 cites
- 3154US2025210363A1Fast atomic layer etchLAM RES CORP·Filed 2023·Application pending·0 cites
- 3254US2025239434A1Plasma systems and methods for using square-shaped pulse signalsLAM RES CORP·Filed 2022·Application pending·0 cites
- 3353US6309979B1Methods for reducing plasma-induced charging damageLAM RES CORP·Filed 1996·Granted Oct 30, 2001·23 cites·43 claims
- 3451US2023290611A1Distributed plasma source arrayLAM RES CORP·Filed 2021·Application pending·0 cites
- 3547US5217566ADensifying and polishing glass layersLSI LOGIC CORP·Filed 1991·Granted Jun 8, 1993·16 cites·5 claims
- 3641US2016104128A1Mobile device user interface for supporting service maintenance and tracking activities in semiconductor toolLAM RES CORP·Filed 2015·Application pending·0 cites
- 3730US5354706AFormation of uniform dimension conductive lines on a semiconductor waferLSI LOGIC CORP·Filed 1993·Granted Oct 11, 1994·2 cites·20 claims
- 3829US2001049196A1Apparatus for improving etch uniformity and methods thereforFiled 1997·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →