Inventor · disambiguated record
Ren-Guey Hsieh
Also filed as: HSIEH REN-GUEY
7 granted patents·270 citations·filing 1998–2012
83Inventor score
Technology areasG03F
Top patents by PatentIndex Score
7 records- 0195US6737199B1Using new pattern fracturing rules for optical proximity correction mask-making to improve critical dimension uniformityTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted May 18, 2004·228 cites·14 claims
- 0272US6311319B1Solving line-end shortening and corner rounding problems by using a simple checking ruleTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Oct 30, 2001·34 cites·15 claims
- 0355US6861179B1Charge effect and electrostatic damage prevention method on photo-maskTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Mar 1, 2005·4 cites·28 claims
- 0453US7011926B2Gap forming pattern fracturing method for forming optical proximity corrected masking layerTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Mar 14, 2006·4 cites·13 claims
- 0552US8624345B2Photomask and photomask substrate with reduced light scattering propertiesWU KEN·Filed 2012·Granted Jan 7, 2014·0 cites·18 claims
- 0647US8198118B2Method for forming a robust mask with reduced light scatteringWU KEN·Filed 2006·Granted Jun 12, 2012·0 cites·20 claims
- 0734US6660439B1Method to reduce data size and data preparation time for optical proximity correction of photo masksTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Dec 9, 2003·0 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →