Inventor · disambiguated record
Yusuke Fuji
Also filed as: FUJI YUSUKE
16 granted patents·5 pending applications·59 citations·filing 2004–2016
90Inventor score
Top patents by PatentIndex Score
21 records- 0187US8357015B2Metal-resin compound memberNGK SPARK PLUG CO·Filed 2008·Granted Jan 22, 2013·16 cites·11 claims
- 0287US8048612B2Polymer and chemically amplified resist composition comprising the sameSUMITOMO CHEMICAL CO·Filed 2009·Granted Nov 1, 2011·10 cites·6 claims
- 0385US7794914B2Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2007·Granted Sep 14, 2010·8 cites·4 claims
- 0482US10578506B2Pressure sensor that measures the pressure within a combustion chamber of an internal combustion engineNGK SPARK PLUG CO·Filed 2016·Granted Mar 3, 2020·4 cites·11 claims
- 0582US10183893B2Compact drying methodNGK INSULATORS LTD·Filed 2015·Granted Jan 22, 2019·2 cites·6 claims
- 0677US7981985B2Polymer and chemically amplified resist composition comprising the sameSUMITOMO CHEMICAL CO·Filed 2009·Granted Jul 19, 2011·4 cites·6 claims
- 0776US9051405B2Resin and resist compositionICHIKAWA KOJI·Filed 2010·Granted Jun 9, 2015·2 cites·5 claims
- 0873US9735552B2Spark plugNGK SPARK PLUG CO·Filed 2014·Granted Aug 15, 2017·2 cites·14 claims
- 0963US7572570B2Chemically amplified resist compositionSUMITOMO CHEMICAL CO·Filed 2008·Granted Aug 11, 2009·1 cites·13 claims
- 1062US10766992B2Resin and resist compositionSUMITOMO CHEMICAL CO·Filed 2015·Granted Sep 8, 2020·0 cites·1 claims
- 1155US8062829B2Chemically amplified resist composition and chemically amplified resist composition for immersion lithographyHATA MITSUHIRO·Filed 2009·Granted Nov 22, 2011·1 cites·12 claims
- 1250US7175963B2Chemical amplification type positive resist composition and a resin thereforSUMITOMO CHEMICAL CO·Filed 2004·Granted Feb 13, 2007·9 cites·8 claims
- 1349US2010167199A1Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2009·Application pending·0 cites
- 1446US8062830B2Chemically amplified positive resist compositionFUJI YUSUKE·Filed 2009·Granted Nov 22, 2011·0 cites·13 claims
- 1543US10801908B2Diaphragm suppressing pressure sensorNGK SPARK PLUG CO·Filed 2016·Granted Oct 13, 2020·0 cites·8 claims
- 1642US9809014B2Resin joined body and method for manufacturing sameNGK SPARK PLUG CO·Filed 2012·Granted Nov 7, 2017·0 cites·7 claims
- 1742US2007072120A1Method for producing resin for chemically amplified positive resistSUMITOMO SEIKA CHEMICALS·Filed 2006·Application pending·0 cites
- 1841US2010279226A1Resist processing methodHATA MITSUHIRO·Filed 2008·Application pending·0 cites
- 1937US2010273112A1Process for producing photoresist patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 2036US2010203446A1Chemically amplified photoresist composition and method for forming patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 2128US8057983B2Chemically amplified positive resist compositionFUJI YUSUKE·Filed 2009·Granted Nov 15, 2011·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →