Inventor · disambiguated record
Tadashi Saga
Also filed as: SAGA TADASHI
14 granted patents·2 pending applications·135 citations·filing 2004–2010
92Inventor score
Top patents by PatentIndex Score
16 records- 0196US7767366B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 3, 2010·34 cites·23 claims
- 0295US8012654B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Sep 6, 2011·11 cites·22 claims
- 0395US7771893B2Photomask blank, photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2006·Granted Aug 10, 2010·28 cites·20 claims
- 0494US8003284B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Aug 23, 2011·9 cites·23 claims
- 0590US7989124B2Photomask blank and photomask making methodTOPPAN PRINTING CO LTD·Filed 2010·Granted Aug 2, 2011·6 cites·19 claims
- 0689US7767367B2Photomask blank and photomask making methodTOPPAN PRINTING CO LTD·Filed 2007·Granted Aug 3, 2010·10 cites·35 claims
- 0789US7691546B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 6, 2010·10 cites·8 claims
- 0886US7790339B2Photomask blankSHINETSU CHEMICAL CO·Filed 2007·Granted Sep 7, 2010·8 cites·7 claims
- 0986US7618753B2Photomask blank, photomask and method for producing thoseSHINETSU CHEMICAL CO·Filed 2005·Granted Nov 17, 2009·8 cites·20 claims
- 1077US8007964B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Aug 30, 2011·2 cites·17 claims
- 1172US7556892B2Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer methodSHINETSU CHEMICAL CO·Filed 2005·Granted Jul 7, 2009·3 cites·28 claims
- 1271US7625677B2Half-tone stacked film, photomask-blank, photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2006·Granted Dec 1, 2009·3 cites·26 claims
- 1357US7598004B2Film-depositing target and preparation of phase shift mask blankSHINETSU CHEMICAL CO·Filed 2005·Granted Oct 6, 2009·0 cites·5 claims
- 1454US2009057143A1Film-depositing target and preparation of phase shift mask blankYOSHIKAWA HIROKI·Filed 2008·Application pending·0 cites
- 1551US7351505B2Phase shift mask blank, phase shift mask, and pattern transfer methodSHINETSU CHEMICAL CO·Filed 2004·Granted Apr 1, 2008·3 cites·9 claims
- 1646US2010155819A1Method of fabricating semiconductor device and semiconductor deviceOGOSHI MASAYUKI·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →