Inventor · disambiguated record
Rudolf Von Bünau
Also filed as: VON BUENAU RUDOLF · VON BUENAU RUDOLF MURAI · VON BUNAU RUDOLF M · VON BUNAU RUDOLF MURAI
19 granted patents·2 pending applications·1,918 citations·filing 1993–2019
95Inventor score
Files withZEISS STIFTUNG8ZEISS CARL MEDITEC AG5HITACHI LTD2HACKER MARTIN1UNIV LELAND STANFORD JUNIOR1
Top patents by PatentIndex Score
21 records- 0198US5715039AProjection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patternsHITACHI LTD·Filed 1996·Granted Feb 3, 1998·1.4k cites·78 claims
- 0295US8801184B2System for the improved imaging of eye structuresHACKER MARTIN·Filed 2011·Granted Aug 12, 2014·20 cites·16 claims
- 0394US6600608B1Catadioptric objective comprising two intermediate imagesZEISS STIFTUNG·Filed 1999·Granted Jul 29, 2003·129 cites·64 claims
- 0492US6504597B2Optical arrangementZEISS STIFTUNG·Filed 2001·Granted Jan 7, 2003·54 cites·15 claims
- 0591US5863712APattern forming method, projection exposure system, and semiconductor device fabrication methodHITACHI LTD·Filed 1997·Granted Jan 26, 1999·90 cites·20 claims
- 0689US6781668B2Optical arrangementZEISS STIFTUNG·Filed 2000·Granted Aug 24, 2004·36 cites·14 claims
- 0788US6784977B2Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Aug 31, 2004·43 cites·12 claims
- 0888US6521877B1Optical arrangement having improved temperature distribution within an optical elementZEISS STIFTUNG·Filed 2000·Granted Feb 18, 2003·37 cites·17 claims
- 0987US6522392B1Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical systemZEISS STIFTUNG·Filed 2000·Granted Feb 18, 2003·34 cites·5 claims
- 1081US6583850B2Optical systemZEISS STIFTUNG·Filed 2001·Granted Jun 24, 2003·21 cites·24 claims
- 1180US6466382B2Optical arrangementZEISS STIFTUNG·Filed 2000·Granted Oct 15, 2002·26 cites·10 claims
- 1275US6445442B2Projection-microlithographic deviceZEISS STIFTUNG·Filed 2001·Granted Sep 3, 2002·14 cites·25 claims
- 1367US5438204ATwin-mask, and method and system for using same to pattern microelectronic substratesUNIV LELAND STANFORD JUNIOR·Filed 1993·Granted Aug 1, 1995·20 cites·30 claims
- 1457US9814382B2Method for determining the power of an intraocular lensZEISS CARL MEDITEC AG·Filed 2016·Granted Nov 14, 2017·0 cites·11 claims
- 1553US6593998B2Projection exposure systemZEISS CARL SMT AG·Filed 2001·Granted Jul 15, 2003·4 cites·44 claims
- 1652US9462938B2Method for determining the power of an intraocular lensZEISS CARL MEDITEC AG·Filed 2015·Granted Oct 11, 2016·0 cites·3 claims
- 1748US12295661B2Combination device for tonometrical measuring and drug application on an eyeZEISS CARL AG·Filed 2019·Granted May 13, 2025·0 cites·42 claims
- 1846US9144375B2Method for determining the power of an intraocular lensVON BÜNAU RUDOLF MURAI·Filed 2009·Granted Sep 29, 2015·0 cites·3 claims
- 1946US2021015665A1Shunt implantZEISS CARL MEDITEC AG·Filed 2019·Application pending·0 cites
- 2043US10194797B2Method for selecting an intraocular lens to be implanted into an eyeZEISS CARL MEDITEC AG·Filed 2016·Granted Feb 5, 2019·0 cites·12 claims
- 2138US2010302550A1Device and method for the optical measurement of relative distancesZEISS CARL MEDITEC AG·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →