Inventor · disambiguated record
Koichi Sakabe
Also filed as: SAKABE KOICHI
10 granted patents·3 pending applications·13 citations·filing 2013–2020
80Inventor score
Top patents by PatentIndex Score
13 records- 0194US10023712B2Heat-expandable microspheres, process for producing the same and application thereofMATSUMOTO YUSHI SEIYAKU KK·Filed 2015·Granted Jul 17, 2018·10 cites·12 claims
- 0271US10703936B2Polishing compositionFUJIMI INC·Filed 2017·Granted Jul 7, 2020·2 cites·11 claims
- 0363US12139622B2Hollow resin particles for thermosensitive recording mediaMATSUMOTO YUSHI SEIYAKU KK·Filed 2020·Granted Nov 12, 2024·0 cites·9 claims
- 0463US10144907B2Polishing compositionFUJIMI INC·Filed 2015·Granted Dec 4, 2018·1 cites·12 claims
- 0553US2016160000A1Process for producing heat-expandable microspheresMATSUMOTO YUSHI SEIYAKU KK·Filed 2014·Application pending·0 cites
- 0649US10731021B2Process for producing heat-expandable microspheres and application thereofMATSUMOTO YUSHI SEIYAKU KK·Filed 2016·Granted Aug 4, 2020·0 cites·17 claims
- 0747US9837283B2Polishing compositionFUJIMI INC·Filed 2013·Granted Dec 5, 2017·0 cites·8 claims
- 0845US10781342B2Polishing compositionFUJIMI INC·Filed 2016·Granted Sep 22, 2020·0 cites·12 claims
- 0941US11377627B2Composition for surface treatment, method for producing the same, and surface treatment method using the sameFUJIMI INC·Filed 2018·Granted Jul 5, 2022·0 cites·18 claims
- 1039US10858615B2Surface treatment composition, preparation method thereof, surface treatment method using the sameFUJIMI INC·Filed 2018·Granted Dec 8, 2020·0 cites·20 claims
- 1136US11643573B2Polishing composition, production method therefor, and polishing method and production method for substrate, using polishing compositionFUJIMI INC·Filed 2018·Granted May 9, 2023·0 cites·20 claims
- 1234US2019300821A1Surface treatment compositionFUJIMI INC·Filed 2017·Application pending·0 cites
- 1329US2017292039A1Polishing composition, method for manufacturing same, and polishing methodFUJIMI INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →