Inventor · disambiguated record
Hisashi Genjima
Also filed as: GENJIMA HISASHI
8 granted patents·1 pending application·16 citations·filing 2014–2023
78Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD9
Top patents by PatentIndex Score
9 records- 0193US9418860B2Use of topography to direct assembly of block copolymers in grapho-epitaxial applicationsTOKYO ELECTRON LTD·Filed 2014·Granted Aug 16, 2016·12 cites·20 claims
- 0279US11315784B2Method for forming insulating film, apparatus for processing substrate, and system for processing substrateTOKYO ELECTRON LTD·Filed 2018·Granted Apr 26, 2022·2 cites·9 claims
- 0377US10418242B2Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymersTOKYO ELECTRON LTD·Filed 2015·Granted Sep 17, 2019·2 cites·3 claims
- 0466US11823897B2Method for forming insulating film, apparatus for processing substrate, and system for processing substrateTOKYO ELECTRON LTD·Filed 2022·Granted Nov 21, 2023·0 cites·7 claims
- 0558US11574812B2Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymersTOKYO ELECTRON LTD·Filed 2019·Granted Feb 7, 2023·0 cites·3 claims
- 0651US2024027923A1Substrate processing apparatus, substrate processing method, and recording mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0742US11631581B2Insulating film forming method, insulating film forming device, and substrate processing systemTOKYO ELECTRON LTD·Filed 2018·Granted Apr 18, 2023·0 cites·14 claims
- 0840US10586711B2Substrate processing method and computer storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Mar 10, 2020·0 cites·12 claims
- 0935US10329144B2Substrate treatment method, computer storage medium and substrate treatment systemTOKYO ELECTRON LTD·Filed 2016·Granted Jun 25, 2019·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →