Inventor · disambiguated record
Leonid Aizikovitch Sjmaenok
Also filed as: SJMAENOK LEONID AIZIKOVITCH
8 granted patents·1 pending application·36 citations·filing 2004–2012
83Inventor score
Files withASML NETHERLANDS BV3SJMAENOK LEONID AIZIKOVITCH2YAKUNIN ANDREI MIKHAILOVICH2BANINE VADIM YEVGENYEVICH1GLUSHKOV DENIS ALEXANDROVICH1
Top patents by PatentIndex Score
9 records- 0189US9897930B2Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical elementSJMAENOK LEONID AIZIKOVITCH·Filed 2009·Granted Feb 20, 2018·14 cites·18 claims
- 0284US7612353B2Lithographic apparatus, contaminant trap, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Nov 3, 2009·8 cites·19 claims
- 0381US7397056B2Lithographic apparatus, contaminant trap, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jul 8, 2008·7 cites·75 claims
- 0463US9448492B2Multilayer mirror, method of producing a multilayer mirror and lithographic apparatusYAKUNIN ANDREI MIKHAILOVICH·Filed 2012·Granted Sep 20, 2016·2 cites·12 claims
- 0563US9285690B2Mirror, lithographic apparatus and device manufacturing methodBANINE VADIM YEVGENYEVICH·Filed 2009·Granted Mar 15, 2016·1 cites·13 claims
- 0659US9529283B2Radiation source, lithographic apparatus, and device manufacturing methodYAKUNIN ANDREI MIKHAILOVICH·Filed 2009·Granted Dec 27, 2016·2 cites·19 claims
- 0756US9082521B2EUV multilayer mirror with interlayer and lithographic apparatus using the mirrorGLUSHKOV DENIS ALEXANDROVICH·Filed 2010·Granted Jul 14, 2015·1 cites·15 claims
- 0847US2011080573A1Multilayer mirror and lithographic apparatusASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 0944USRE43036EFilter for extreme ultraviolet lithographySJMAENOK LEONID AIZIKOVITCH·Filed 2004·Granted Dec 20, 2011·1 cites·59 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →