Inventor · disambiguated record
Rie Kikuchi
Also filed as: KIKUCHI RIE
10 granted patents·2 pending applications·55 citations·filing 1996–2017
85Inventor score
Top patents by PatentIndex Score
12 records- 0191US9805943B2Polymer for resist under layer film composition, resist under layer film composition, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 31, 2017·7 cites·32 claims
- 0287US9728420B2Organic film composition, process for forming organic film, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 8, 2017·5 cites·15 claims
- 0383US9312127B2Method for producing semiconductor apparatus substrateSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 12, 2016·4 cites·20 claims
- 0481US10429739B2Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 1, 2019·3 cites·18 claims
- 0579US5863601AProcess of producing graphite fiberJAPAN RES DEV CORP·Filed 1996·Granted Jan 26, 1999·34 cites·15 claims
- 0664US9902875B2Composition for forming a coating type BPSG film, substrate, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Feb 27, 2018·1 cites·27 claims
- 0763US9580623B2Patterning process using a boron phosphorus silicon glass filmSHINETSU CHEMICAL CO·Filed 2015·Granted Feb 28, 2017·1 cites·12 claims
- 0859US2011127168A1Hard gold-based plating solutionKIKUCHI RIE·Filed 2009·Application pending·0 cites
- 0949US9984891B2Method for forming organic film and method for manufacturing substrate for semiconductor apparatusSHINETSU CHEMICAL CO·Filed 2017·Granted May 29, 2018·0 cites·14 claims
- 1044US10620537B2Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film compositionSHINETSU CHEMICAL CO·Filed 2017·Granted Apr 14, 2020·0 cites·25 claims
- 1141US2012171367A1Displacement gold plating solution and method for forming connecting portionKIKUCHI RIE·Filed 2011·Application pending·0 cites
- 1234US9880470B2Composition for forming a coating type silicon-containing film, substrate, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Jan 30, 2018·0 cites·18 claims
Join the waitlist — get patent alerts
Get an alert when Rie Kikuchi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →