Inventor · disambiguated record
Hidekazu Tajima
Also filed as: TAJIMA HIDEKAZU
5 granted patents·2 pending applications·31 citations·filing 2005–2006
77Inventor score
Files withTOKYO OHKA KOGYO CO LTD7
Top patents by PatentIndex Score
7 records- 0189US7741260B2Rinsing fluid for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jun 22, 2010·12 cites·4 claims
- 0287US7795197B2Cleaning liquid for lithography and method for resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Sep 14, 2010·10 cites·13 claims
- 0380US8367312B2Detergent for lithography and method of forming resist pattern with the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Feb 5, 2013·5 cites·8 claims
- 0471US7897325B2Lithographic rinse solution and method for forming patterned resist layer using the sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 1, 2011·2 cites·8 claims
- 0567US7811748B2Resist pattern forming method and composite rinse agentTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Oct 12, 2010·2 cites·12 claims
- 0641US2008193876A1Rinsing Liquid for Lithography and Method for Resist Pattern FormationTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 0740US2007218412A1Rinse Solution For LithographyTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →