Inventor · disambiguated record
Oliver Dier
Also filed as: DIER OLIVER
9 granted patents·4 pending applications·10 citations·filing 2013–2024
80Inventor score
Top patents by PatentIndex Score
13 records- 0172US10161808B2Method and arrangement for determining the heating condition of a mirror in an optical systemZEISS CARL SMT GMBH·Filed 2013·Granted Dec 25, 2018·3 cites·27 claims
- 0271US9997268B2EUV-mirror, optical system with EUV-mirror and associated operating methodZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·1 cites·22 claims
- 0371US9442383B2EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating methodZEISS CARL SMT GMBH·Filed 2013·Granted Sep 13, 2016·3 cites·25 claims
- 0470US10331048B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Jun 25, 2019·1 cites·20 claims
- 0565US9921483B2Surface correction of mirrors with decoupling coatingZEISS CARL SMT GMBH·Filed 2015·Granted Mar 20, 2018·1 cites·20 claims
- 0662US2024419066A1Method for incorporating temperature-regulating hollow structures into a substrate, in particular into a substrate for an optical element, method and substrate for producing an optical element, optical element, processing system and also apparatus pertaining to semiconductor technology and structured electronic componentZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0761US10203435B2EUV mirror and optical system comprising EUV mirrorZEISS CARL SMT GMBH·Filed 2016·Granted Feb 12, 2019·1 cites·16 claims
- 0849US2015043060A1Optical Elements Comprising Magnetostrictive MaterialZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 0945US10520827B2Optical system, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Dec 31, 2019·0 cites·21 claims
- 1042US11328831B2Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatusZEISS CARL SMT GMBH·Filed 2018·Granted May 10, 2022·0 cites·16 claims
- 1141US2013176545A1Projection exposure apparatusEHM DIRK HEINRICH·Filed 2013·Application pending·0 cites
- 1236US2019064405A1Optical element and optical assembly comprising sameZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1334US9915873B2Reflective optical element, and optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 13, 2018·0 cites·24 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →