Inventor · disambiguated record
Ken Yoshioka
Also filed as: YOSHIOKA KEN · YOSHIOKA KEN-ICHI
79 granted patents·36 pending applications·1,674 citations·filing 1991–2023
99Inventor score
Top patents by PatentIndex Score
115 records- 0199US5855726AVacuum processing apparatus and semiconductor manufacturing line using the sameHITACHI LTD·Filed 1996·Granted Jan 5, 1999·407 cites·15 claims
- 0297US6388382B1Plasma processing apparatus and methodHITACHI LTD·Filed 2000·Granted May 14, 2002·78 cites·40 claims
- 0395US6646233B2Wafer stage for wafer processing apparatus and wafer processing methodHITACHI HIGH TECH CORP·Filed 2002·Granted Nov 11, 2003·89 cites·2 claims
- 0494US6833051B2Plasma processing apparatus and methodHITACHI LTD·Filed 2002·Granted Dec 21, 2004·33 cites·13 claims
- 0594US6519504B1Vacuum processing apparatus and semiconductor manufacturing line using the sameHITACHI LTD·Filed 2000·Granted Feb 11, 2003·45 cites·20 claims
- 0694US6373681B2Electrostatic chuck, and method of and apparatus for processing sample using the chuckHITACHI LTD·Filed 2001·Granted Apr 16, 2002·67 cites·2 claims
- 0793US7138606B2Wafer processing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Nov 21, 2006·53 cites·12 claims
- 0892US6756737B2Plasma processing apparatus and methodHITACHI LTD·Filed 2002·Granted Jun 29, 2004·37 cites·4 claims
- 0992US6180019B1Plasma processing apparatus and methodHITACHI LTD·Filed 1997·Granted Jan 30, 2001·51 cites·2 claims
- 1091US6499424B2Plasma processing apparatus and methodHITACHI LTD·Filed 2001·Granted Dec 31, 2002·23 cites·12 claims
- 1191US6245202B1Plasma treatment deviceHITACHI LTD·Filed 1996·Granted Jun 12, 2001·115 cites·16 claims
- 1290US6895179B2Wafer stage for wafer processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted May 17, 2005·37 cites·5 claims
- 1390US5946184AElectrostatic chuck, and method of and apparatus for processing sampleHITACHI LTD·Filed 1997·Granted Aug 31, 1999·87 cites·6 claims
- 1489US6825617B2Semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Nov 30, 2004·37 cites·11 claims
- 1588US8252132B2Method and apparatus for repairing an electrostatic chuck device, and the electrostatic chuck deviceYOSHIOKA KEN·Filed 2010·Granted Aug 28, 2012·9 cites·9 claims
- 1688US7744721B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2009·Granted Jun 29, 2010·7 cites·2 claims
- 1786US7833429B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2007·Granted Nov 16, 2010·7 cites·4 claims
- 1886US7224568B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted May 29, 2007·12 cites·12 claims
- 1984US9378929B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Jun 28, 2016·4 cites·4 claims
- 2083US8951385B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2013·Granted Feb 10, 2015·5 cites·3 claims
- 2182US8083889B2Apparatus and method for plasma etchingMIYA GO·Filed 2009·Granted Dec 27, 2011·6 cites·2 claims
- 2282US7347656B2Vacuum processing apparatus and semiconductor manufacturing line using the sameHITACHI LTD·Filed 2005·Granted Mar 25, 2008·3 cites·14 claims
- 2382US6846363B2Plasma processing apparatus and methodHITACHI LTD·Filed 2002·Granted Jan 25, 2005·11 cites·6 claims
- 2482US6243251B1Electrostatic chuck, and method of and apparatus for processing sample using the chuckHITACHI LTD·Filed 1999·Granted Jun 5, 2001·50 cites·2 claims
- 2581US6481370B2Plasma processsing apparatusHITACHI LTD·Filed 2000·Granted Nov 19, 2002·10 cites·9 claims
- 2680US7608162B2Plasma processing apparatus and methodHITACHI LTD·Filed 2007·Granted Oct 27, 2009·4 cites·7 claims
- 2780US6837005B2Weatherstrip for automobileNISHIKAWA RUBBER CO LTD·Filed 2002·Granted Jan 4, 2005·30 cites·17 claims
- 2880US6677244B2Specimen surface processing methodHITACHI LTD·Filed 2002·Granted Jan 13, 2004·18 cites·4 claims
- 2979US8062473B2Plasma processing apparatus and methodNISHIO RYOJI·Filed 2008·Granted Nov 22, 2011·4 cites·3 claims
- 3079US6549393B2Semiconductor wafer processing apparatus and methodHITACHI LTD·Filed 2001·Granted Apr 15, 2003·19 cites·8 claims
- 3179US6172321B1Method and apparatus for plasma processing apparatusHITACHI LTD·Filed 1999·Granted Jan 9, 2001·26 cites·4 claims
- 3277US6430878B2Glass guideTOYODA GOSEI KK·Filed 2001·Granted Aug 13, 2002·23 cites·20 claims
- 3377US6034346AMethod and apparatus for plasma processing apparatusHITACHI LTD·Filed 1996·Granted Mar 7, 2000·27 cites·11 claims
- 3476US6759338B2Plasma processing apparatus and methodHITACHI LTD·Filed 2001·Granted Jul 6, 2004·9 cites·5 claims
- 3574US6752579B2Vacuum processing apparatus and semiconductor manufacturing line using the sameHITACHI LTD·Filed 2001·Granted Jun 22, 2004·7 cites·27 claims
- 3673US6850012B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Feb 1, 2005·10 cites·10 claims
- 3772US9039865B2Plasma processing apparatusYOSHIOKA KEN·Filed 2010·Granted May 26, 2015·3 cites·7 claims
- 3870US7713756B2Apparatus and method for plasma etchingHITACHI HIGH TECH CORP·Filed 2007·Granted May 11, 2010·2 cites·2 claims
- 3970US6705828B2Vacuum processing apparatus and semiconductor manufacturing line using the sameHITACHI LTD·Filed 2001·Granted Mar 16, 2004·11 cites·3 claims
- 4070US6526330B2Vacuum processing apparatus and semiconductor manufacturing line using the sameHITACHI LTD·Filed 2001·Granted Feb 25, 2003·5 cites·5 claims
- 4169US6491832B2Method for processing specimensHITACHI LTD·Filed 2000·Granted Dec 10, 2002·12 cites·4 claims
- 4268US8940128B2Plasma processing apparatusSAKKA YUSAKU·Filed 2010·Granted Jan 27, 2015·4 cites·3 claims
- 4368US6649021B2Apparatus and method for plasma processing high-speed semiconductor circuits with increased yieldHITACHI LTD·Filed 2001·Granted Nov 18, 2003·9 cites·5 claims
- 4467US8231759B2Plasma processing apparatusEDAMURA MANABU·Filed 2010·Granted Jul 31, 2012·1 cites·5 claims
- 4564US9017786B2Method and apparatus for repairing an electrostatic chuck device, and the electrostatic chuck deviceYOSHIOKA KEN·Filed 2012·Granted Apr 28, 2015·1 cites·11 claims
- 4663US7740739B2Plasma processing apparatus and methodHITACHI HIGH TECH CORP·Filed 2004·Granted Jun 22, 2010·5 cites·9 claims
- 4763US6752580B2Vacuum processing apparatus and semiconductor manufacturing line using the sameHITACHI LTD·Filed 2001·Granted Jun 22, 2004·3 cites·14 claims
- 4862US6672819B1Vacuum processing apparatus and semiconductor manufacturing line using the sameHITACHI LTD·Filed 2000·Granted Jan 6, 2004·7 cites·6 claims
- 4962US2009220322A1Vacuum Processing Apparatus And Semiconductor Manufacturing Line Using The SameSORAOKA MINORU·Filed 2009·Application pending·0 cites
- 5060US8795467B2Plasma processing apparatus and methodNISHIO RYOJI·Filed 2009·Granted Aug 5, 2014·0 cites·4 claims
Showing the top 50 of 115 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →