Inventor · disambiguated record
Hajime Furutani
Also filed as: FURUTANI HAJIME
7 granted patents·6 pending applications·13 citations·filing 2015–2020
77Inventor score
Files withFUJIFILM CORP13
Top patents by PatentIndex Score
13 records- 0190US9523912B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compoundFUJIFILM CORP·Filed 2015·Granted Dec 20, 2016·7 cites·14 claims
- 0286US11703758B2Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Jul 18, 2023·2 cites·12 claims
- 0381US11953829B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Apr 9, 2024·1 cites·13 claims
- 0481US11656548B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted May 23, 2023·1 cites·21 claims
- 0572US11604414B2Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Granted Mar 14, 2023·1 cites·13 claims
- 0670US10303058B2Pattern forming method, treating agent, electronic device, and method for manufacturing the sameFUJIFILM CORP·Filed 2016·Granted May 28, 2019·1 cites·8 claims
- 0746US2019219922A1Resist composition, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 0844US2019187558A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 0942US11640113B2Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Granted May 2, 2023·0 cites·11 claims
- 1036US2017059995A1Pattern forming method, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 1134US2016195814A1Pattern formation method, electronic-device production method, and processing agentFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 1234US2016048082A1Pattern-forming method, electronic device and method for producing same, and developing fluidFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 1333US2015331314A1Pattern forming method, compound used therein, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →