Inventor · disambiguated record
Naohisa Tamada
Also filed as: TAMADA NAOHISA
9 granted patents·2 pending applications·79 citations·filing 1997–2017
86Inventor score
Top patents by PatentIndex Score
11 records- 0173US5868560AReticle, pattern transferred thereby, and correction methodMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Feb 9, 1999·37 cites·13 claims
- 0270US6797443B2Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor deviceRENESAS TECH CORP·Filed 2001·Granted Sep 28, 2004·13 cites·9 claims
- 0367US6764794B2Photomask for focus monitoringRENESAS TECH CORP·Filed 2002·Granted Jul 20, 2004·11 cites·14 claims
- 0460US6869735B2Method of pattern layout of a photomask for pattern transferRENESAS TECH CORP·Filed 2003·Granted Mar 22, 2005·8 cites·3 claims
- 0550US6890692B2Method of focus monitoring and manufacturing method for an electronic deviceRENESAS TECH CORP·Filed 2004·Granted May 10, 2005·2 cites·4 claims
- 0648US9711936B2Semiconductor laser and method for manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 2016·Granted Jul 18, 2017·0 cites·13 claims
- 0741US6395456B1Semiconductor device achieving higher integration, method of manufacturing thereof, and method of forming resist pattern used thereforMITSUBISHI ELECTRIC CORP·Filed 1999·Granted May 28, 2002·7 cites·16 claims
- 0838US11018004B2Method of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2017·Granted May 25, 2021·0 cites·5 claims
- 0937US2005064676A1Method of forming alignment markRENESAS TECH CORP·Filed 2004·Application pending·0 cites
- 1029US6503665B1Phase shift mask and semiconductor device fabricated with the phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Jan 7, 2003·1 cites·7 claims
- 1128US2003203286A1High-transmittance halftone phase shift mask and manufacturing method of semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →