Inventor · disambiguated record
Yun-Sook Chae
Also filed as: CHAE YUN-SOOK
8 granted patents·4 pending applications·2,837 citations·filing 1998–2007
92Inventor score
Top patents by PatentIndex Score
12 records- 0198US6478872B1Method of delivering gas into reaction chamber and shower head used to deliver gasSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Nov 12, 2002·814 cites·13 claims
- 0298US6174809B1Method for forming metal layer using atomic layer depositionSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Jan 16, 2001·1.2k cites·25 claims
- 0397US6458701B1Method for forming metal layer of semiconductor device using metal halide gasSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Oct 1, 2002·238 cites·10 claims
- 0497US6197683B1Method of forming metal nitride film by chemical vapor deposition and method of forming metal contact of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Mar 6, 2001·316 cites·17 claims
- 0596US6372598B2Method of forming selective metal layer and method of forming capacitor and filling contact hole using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Apr 16, 2002·283 cites·32 claims
- 0665US6835970B2Semiconductor device having self-aligned contact pads and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 28, 2004·13 cites·22 claims
- 0760US7297466B2Method of forming a photoresist pattern and method for patterning a layer using a photoresistSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Nov 20, 2007·7 cites·2 claims
- 0845US2003000473A1Method of delivering gas into reaction chamber and shower head used to deliver gasFiled 2002·Application pending·0 cites
- 0944US2007197014A1Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1042US2006228895A1Method of forming fine pitch photoresist patterns using double patterning techniqueCHAE YUN-SOOK·Filed 2006·Application pending·0 cites
- 1139US2007023916A1Semiconductor structure with multiple bottom anti-reflective coating layer and method of forming photoresist pattern and pattern of semiconductor device using the same structureHAH JUNG-HWAN·Filed 2006·Application pending·0 cites
- 1238US7572736B2Method of dry-etching semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Aug 11, 2009·0 cites·24 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →