Inventor · disambiguated record
Michael Hatzakis
Also filed as: HATZAKIS JR MICHAEL · HATZAKIS MICHAEL
32 granted patents·995 citations·filing 1975–1998
98Inventor score
Top patents by PatentIndex Score
32 records- 0197US4212935AMethod of modifying the development profile of photoresistsIBM·Filed 1978·Granted Jul 15, 1980·99 cites·24 claims
- 0296US4142107AResist development control systemIBM·Filed 1977·Granted Feb 27, 1979·87 cites·16 claims
- 0393US5171992ANanometer scale probe for an atomic force microscope, and method for making sameIBM·Filed 1991·Granted Dec 15, 1992·119 cites·27 claims
- 0491US5041358ANegative photoresist and use thereofIBM·Filed 1989·Granted Aug 20, 1991·58 cites·19 claims
- 0590US4086870ANovel resist spinning headIBM·Filed 1977·Granted May 2, 1978·72 cites·12 claims
- 0688US4156745AElectron sensitive resist and a method preparing the sameIBM·Filed 1978·Granted May 29, 1979·37 cites·10 claims
- 0785US4024293AHigh sensitivity resist system for lift-off metallizationIBM·Filed 1975·Granted May 17, 1977·30 cites·19 claims
- 0883US6097019ARadiation control systemIBM·Filed 1998·Granted Aug 1, 2000·58 cites·19 claims
- 0981US5241040AMicrowave processingIBM·Filed 1990·Granted Aug 31, 1993·32 cites·13 claims
- 1081US3984582AMethod for preparing positive resist imageIBM·Filed 1975·Granted Oct 5, 1976·38 cites·29 claims
- 1180US4782008APlasma-resistant polymeric material, preparation thereof, and use thereofIBM·Filed 1985·Granted Nov 1, 1988·33 cites·25 claims
- 1280US4581100AMixed excitation plasma etching systemIBM·Filed 1984·Granted Apr 8, 1986·40 cites·10 claims
- 1377US5837978ARadiation control systemIBM·Filed 1996·Granted Nov 17, 1998·41 cites·22 claims
- 1476US4035522AX-ray lithography maskIBM·Filed 1976·Granted Jul 12, 1977·31 cites·5 claims
- 1570US5059512AUltraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositionsIBM·Filed 1989·Granted Oct 22, 1991·27 cites·16 claims
- 1667US4087569APrebaking treatment for resist mask composition and mask making process using sameIBM·Filed 1976·Granted May 2, 1978·20 cites·7 claims
- 1767US3957552AMethod for making multilayer devices using only a single critical masking stepIBM·Filed 1975·Granted May 18, 1976·23 cites·14 claims
- 1862US4379833ASelf-aligned photoresist processIBM·Filed 1981·Granted Apr 12, 1983·25 cites·8 claims
- 1960US4693960APhotolithographic etching process using organosilicon polymer compositionIBM·Filed 1986·Granted Sep 15, 1987·17 cites·10 claims
- 2057US5141817ADielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stabilityIBM·Filed 1989·Granted Aug 25, 1992·18 cites·15 claims
- 2157US4981909APlasma-resistant polymeric material, preparation thereof, and use thereofIBM·Filed 1988·Granted Jan 1, 1991·12 cites·19 claims
- 2255US4603195AOrganosilicon compound and use thereof in photolithographyIBM·Filed 1983·Granted Jul 29, 1986·11 cites·24 claims
- 2354US4001061ASingle lithography for multiple-layer bubble domain devicesIBM·Filed 1975·Granted Jan 4, 1977·9 cites·9 claims
- 2450US5098816AMethod for forming a pattern of a photoresistIBM·Filed 1991·Granted Mar 24, 1992·10 cites·12 claims
- 2549US5110711AMethod for forming a patternIBM·Filed 1991·Granted May 5, 1992·9 cites·8 claims
- 2647US4259369AImage hardening processIBM·Filed 1979·Granted Mar 31, 1981·8 cites·11 claims
- 2745US5115095AEpoxy functional organosilicon polymerIBM·Filed 1991·Granted May 19, 1992·7 cites·6 claims
- 2843US5565529ADielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stabilityIBM·Filed 1993·Granted Oct 15, 1996·11 cites·10 claims
- 2942US5340914AMicrowave processingIBM·Filed 1993·Granted Aug 23, 1994·5 cites·20 claims
- 3040US5238773AAlkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groupsIBM·Filed 1992·Granted Aug 24, 1993·5 cites·18 claims
- 3135US4678850AHalogenated polystyrenes for electron beam, X-ray and photo resistsIBM·Filed 1984·Granted Jul 7, 1987·3 cites·8 claims
- 3217US6296989B1Silylation of epoxy-containing photoresist filmsNAT CT SCIENT RES DEMOKRITOS·Filed 1998·Granted Oct 2, 2001·0 cites·28 claims
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